Inventor
KIESER JOERG
DE25 patents
⚠️ This page may combine multiple inventors who share the name “KIESER JOERG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SIEMENS AG
10 patentsUS5644283AJul 1, 1997
Variable high-current resistor, especially for use as protective element in power switching applications & circuit making use of high-current resistor
SIEMENS AG98 citations95
US5746051AMay 5, 1998
Device for detoxifying exhaust fumes from mobile equipment
SIEMENS AG62 citations94
US6383152B1May 7, 2002
Apparatus for producing shock waves for technical, preferably medical applications
SIEMENS AG37 citations92
US6119455ASep 19, 2000
Process and device for purifying exhaust gases containing nitrogen oxides
SIEMENS AG43 citations92
US5844331ADec 1, 1998
Process for monitoring the wear of at least one contact in a switching device and switching device designed thereof
SIEMENS AG18 citations83
US6417604B1Jul 9, 2002
Low pressure gas discharge switch
SIEMENS AG18 citations82
US5859579AJan 12, 1999
Current--limiting switch
SIEMENS AG13 citations73
US6373669B1Apr 16, 2002
Process and arrangement for selective network monitoring for switchgear
SIEMENS AG10 citations72
US5747984AMay 5, 1998
Switching component for detecting contact erosion
SIEMENS AG12 citations70
US4981839AJan 1, 1991
Method of forming superconducting oxide films using zone annealing
SIEMENS AG4 citations63
LEYBOLD HERAEUS GMBH & CO KG
8 patentsUS4767641AAug 30, 1988
Plasma treatment apparatus
LEYBOLD HERAEUS GMBH & CO KG180 citations98
US4661409AApr 28, 1987
Method of producing amorphous carbon coatings on substrates and substrates coated by this method
LEYBOLD HERAEUS GMBH & CO KG86 citations94
US4569738AFeb 11, 1986
Method of producing amorphous carbon coatings on substrates by plasma deposition
LEYBOLD HERAEUS GMBH & CO KG80 citations94
US4572776AFeb 25, 1986
Magnetron cathode for sputtering ferromagnetic targets
LEYBOLD HERAEUS GMBH & CO KG48 citations92
US4521717AJun 4, 1985
Apparatus for producing a microwave plasma for the treatment of substrates, in particular for the plasma-polymerization of monomers thereon
LEYBOLD HERAEUS GMBH & CO KG20 citations82
US4933064AJun 12, 1990
Sputtering cathode based on the magnetron principle
LEYBOLD HERAEUS GMBH & CO KG21 citations81
US4515675AMay 7, 1985
Magnetron cathode for cathodic evaportion apparatus
LEYBOLD HERAEUS GMBH & CO KG24 citations80
US4630568ADec 23, 1986
Apparatus for coating substrates by plasma polymerization
LEYBOLD HERAEUS GMBH & CO KG8 citations74
LEYBOLD AG
3 patentsUS5053244AOct 1, 1991
Process for depositing silicon oxide on a substrate
LEYBOLD AG25 citations90
US4939424AJul 3, 1990
Apparatus for producing a plasma and for the treatment of substrates
LEYBOLD AG21 citations80
US4847460AJul 11, 1989
Apparatus for injecting microwave energy by means of an open microwave guide
LEYBOLD AG12 citations68
KIESER JOERG
2 patentsUS9211788B2Dec 15, 2015
Method for diagnosing an operating status of a drive device, and diagnostic device and drive system
KIESER JOERG0 citations46
US9260004B2Feb 16, 2016
Method and device for verifying a drive torque applied by an electric machine in a hybrid drive of a motor vehicle
KIESER JOERG0 citations33