Inventor

LENSING KEVIN R

US39 patents

⚠️ This page may combine multiple inventors who share the name “LENSING KEVIN R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LENSING KEVIN R

ADVANCED MICRO DEVICES INC

Method of using scatterometry measurements to control deposition processes

Method and apparatus for identifying misregistration in a complimentary phase shift mask process

Method and apparatus for performing overlay measurements using scatterometry

Method and apparatus for determining grid dimensions using scatterometry

Method of measuring implant profiles using scatterometric techniques wherein dispersion coefficients are varied based upon depth

Method and apparatus for determining column dimensions using scatterometry

Method and apparatus for performing trench depth analysis

Method and apparatus for periodic correction of metrology data

Method and apparatus for characterizing an interconnect structure profile using scatterometry measurements

Method and apparatus for measuring planarity of a polished layer

Method and apparatus for optical film stack fault detection

Method of using scatterometry measurements to control photoresist etch process

Method and apparatus for detecting necking over field/active transitions

Method of detecting degradation in photolithography processes based upon scatterometric measurements of grating structures, and a device comprising such structures

Method and apparatus for classifying faults based on wafer state data and sensor tool trace data

Method and apparatus for determining a root cause of a statistical process control failure

Method and apparatus for generating a polishing process endpoint signal using scatterometry

Method and apparatus for detecting necking over field/active transitions

Method of correcting non-linearity of metrology tools, and system for performing same

Method and apparatus for optical lifetime tracking of trench features

Method of controlling photolithography processes based upon scatterometric measurements of sub-nominal grating structures

Method of controlling metal etch processes, and system for accomplishing same

Method of monitoring anneal processes using scatterometry, and system for performing same

Structures for analyzing electromigration, and methods of using same

Method and apparatus for determining contact opening dimensions using scatterometry

Method of using high yielding spectra scatterometry measurements to control semiconductor manufacturing processes, and systems for accomplishing same

Method and apparatus for integrating multiple sample plans

Method of using scatterometry for analysis of electromigration, and structures for performing same

Method and apparatus for employing previous test insertion results for testing a device

Method and apparatus for dynamic adjustment of sensor and/or metrology sensitivities

Method and apparatus for implementing scaled device tests

Method and apparatus for comparing device and non-device structures

Method and apparatus for matching test equipment calibration

GLOBALFOUNDRIES INC

Determining die test protocols based on process health

Method and apparatus for compensating metrology data for site bias prior to filtering

Method and apparatus for optimizing models for extracting dose and focus from critical dimension

ADVANCED MICRON DEVICES INC

Method of using scatterometry measurements to determine and control gate electrode profiles

ADVANCED MICRODEVICES INC

Method and apparatus for detecting dishing in a polished layer

CHAUHAN SIDDHARTH

Method and apparatus for extracting dose and focus from critical dimension data