Inventor

KAMON KAZUYA

JP52 patents

⚠️ This page may combine multiple inventors who share the name “KAMON KAZUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KAMON KAZUYA

MITSUBISHI ELECTRIC CORP

Apparatus and method for correcting light proximity effects by predicting mask performance

Projection exposure apparatus and polarizer

Mask inspecting method and mask detector

Projection aligner, aberration estimating mask pattern, aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing method

Optical pattern projecting apparatus

Projection exposure apparatus

Projection exposure apparatus

Projection exposure apparatus

Photomask

Projection aligner

Method of forming a pattern using proximity-effect-correction

Exposure apparatus and an exposure method using the same

Apparatus and method for evaluating a projection lens

Projection exposure apparatus

Fly-eye lens device and lighting system including same

Angle detector device for silicon wafers

Projection aligner

Projecting printing apparatus, projection printing method, mask pattern for estimating amplitude aberrations, method of estimating the quantity of amplitude aberration, and amplitude-aberration estimating filter

Projection exposure apparatus

Aberration estimating mask pattern

Reflection Photomask

Photomask and method of manufacturing the same

Exposure method

Alignment mark and aligning method using the same

Exposure apparatus employing a photomask

Projection exposing apparatus and projection exposing method

Projection exposure apparatus

Projection exposure apparatus

Apparatus and method for ultrasonic detection of foreign materials in a specimen

Projection exposure apparatus

Method of and an apparatus for detecting alignment marks

Photomask

Method of manufacturing photomask

Photomask

Photomask

Photomask

Photomask method of manufacture method of test/repair and method of use therefor

Photomask comprising an optical path adjusting film

Projection aligner

Pattern forming method

RENESAS TECH CORP

Simulator for a chemical mechanical polishing

Mask data processor

Layout data saving method, layout data converting device and graphic verifying device

Mask data correction apparatus, fourier transformation apparatus, up sampling apparatus, down sampling apparatus, method of manufacturing transfer mask, and method of manufacturing device having pattern structure

Photomask, fabrication method of photomask, and fabrication method of semiconductor integrated circuit

Projection aligner, aberration estimating mask pattern, aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing method

Projection aligner, aberration estimating mask pattern, aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing method

KAMON KAZUYA

Semiconductor device comprising an antiferroelectric gate insulating film

MITSUBISHI DENKI KABUSHIKI KAISHA

Semiconductor device and method of making the semiconductor device

RENESAS ELECTRONICS CORP

Semiconductor integrated circuit and pattern layouting method for the same