Inventor
WANG TA-WEI
TW20 patents
⚠️ This page may combine multiple inventors who share the name “WANG TA-WEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG
9 patentsUS7465972B2Dec 16, 2008
High performance CMOS device design
TAIWAN SEMICONDUCTOR MFG21 citations92
US7564108B2Jul 21, 2009
Nitrogen treatment to improve high-k gate dielectrics
TAIWAN SEMICONDUCTOR MFG12 citations84
US7253481B2Aug 7, 2007
High performance MOS device with graded silicide
TAIWAN SEMICONDUCTOR MFG15 citations84
US7642607B2Jan 5, 2010
MOS devices with reduced recess on substrate surface
TAIWAN SEMICONDUCTOR MFG7 citations74
US7649233B2Jan 19, 2010
High performance transistor with a highly stressed channel
TAIWAN SEMICONDUCTOR MFG2 citations63
US7323392B2Jan 29, 2008
High performance transistor with a highly stressed channel
TAIWAN SEMICONDUCTOR MFG3 citations63
US7320921B2Jan 22, 2008
Smart grading implant with diffusion retarding implant for making integrated circuit chips
TAIWAN SEMICONDUCTOR MFG3 citations63
US7268362B2Sep 11, 2007
High performance transistors with SiGe strain
TAIWAN SEMICONDUCTOR MFG6 citations63
US9159629B2Oct 13, 2015
High performance CMOS device design
TAIWAN SEMICONDUCTOR MFG0 citations52
WANG CHIH-HAO
4 patentsUS8067280B2Nov 29, 2011
High performance CMOS devices and methods for making same
WANG CHIH-HAO95 citations97
US8507951B2Aug 13, 2013
High performance CMOS device design
WANG CHIH-HAO1 citations62
US8154051B2Apr 10, 2012
MOS transistor with in-channel and laterally positioned stressors
WANG CHIH-HAO3 citations62
US8900980B2Dec 2, 2014
Defect-free SiGe source/drain formation by epitaxy-free process
WANG CHIH-HAO2 citations59