Inventor

UEDA TAKAFUMI

JP54 patents

⚠️ This page may combine multiple inventors who share the name “UEDA TAKAFUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

UEDA TAKAFUMI

SHINETSU CHEMICAL CO

Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern

Positive resist composition suitable for lift-off technique and pattern forming method

Positive resist composition suitable for lift-off technique and pattern forming method

Patterning process

Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process

Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method

Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method

Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method

Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method

Antireflection film composition, substrate, and patterning process

Sacrificial film-forming composition, patterning process, sacrificial film and removal method

Porous film-forming composition, patterning process, and porous sacrificial film

Heat-curable photosensitive compositions

Silicon-containing resist underlayer film-forming composition and patterning process

Patterning process and composition for forming silicon-containing film usable therefor

Silicon-containing resist underlayer film-forming composition and patterning process

Patterning process

Substrate comprising a lower silicone resin film and an upper silicone resin film

Rework process for photoresist film

Sacrificial film-forming composition, patterning process, sacrificial film and removal method

Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process

Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition

Composition for forming titanium-containing resist underlayer film and patterning process

Patterning process

OGIHARA TSUTOMU

Composition for forming resist underlayer film and patterning process using the same

Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process

Patterning process and composition for forming silicon-containing film usable therefor

Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process

Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method

Composition for forming a silicon-containing resist underlayer film and patterning process using the same

Patterning process

Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same

Coated-type silicon-containing film stripping process

IHI CORP

Variable geometry system turbocharger

Variable capacity turbocharger

Turbocharger

Turbocharger

Variable geometry system turbocharger

Variable capacity turbocharger

Variable capacity turbocharger

Turbocharger

Variable nozzle unit and variable geometry system turbocharger

IBM

Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same

Silicon-containing antireflective coatings including non-polymeric silsesquioxanes

DAICEL POLYMER LTD

Electromagnetic wave shielding molded article

Electromagnetic wave shielding and absorbing molded article

SHIN ETSU CHEMICALS CO LTD

Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate protective coating

SHIN ESTU CHEMICAL CO LTD

Rework process for photoresist film

ISHIHARA SANGYO KAISHA

Freeze-dried composition of inactivated virus envelope with membrane fusion activity

MITSUBISHI ELECTRIC CORP

State-monitoring device and maintenance work assistance method