Inventor
HIGASHIJIMA JIRO
JP40 patents
⚠️ This page may combine multiple inventors who share the name “HIGASHIJIMA JIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
20 patentsUS9773687B2Sep 26, 2017
Liquid processing apparatus
TOKYO ELECTRON LTD11 citations83
US11574827B2Feb 7, 2023
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD4 citations74
US11430673B2Aug 30, 2022
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD4 citations73
US9953848B2Apr 24, 2018
Substrate liquid processing apparatus
TOKYO ELECTRON LTD6 citations72
US11056335B2Jul 6, 2021
Substrate processing apparatus
TOKYO ELECTRON LTD1 citations62
US10297473B2May 21, 2019
Liquid processing apparatus
TOKYO ELECTRON LTD1 citations62
US10276425B2Apr 30, 2019
Substrate processing system
TOKYO ELECTRON LTD1 citations61
US8002894B2Aug 23, 2011
Processing apparatus and processing method
TOKYO ELECTRON LTD3 citations59
US12515243B2Jan 6, 2026
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations52
US11715650B2Aug 1, 2023
Substrate processing apparatus and manufacturing method therefor
TOKYO ELECTRON LTD0 citations52
US11024518B2Jun 1, 2021
Substrate processing apparatus, substrate processing method and recording medium
TOKYO ELECTRON LTD0 citations52
US9933702B2Apr 3, 2018
Substrate processing apparatus
TOKYO ELECTRON LTD0 citations52
US9508569B2Nov 29, 2016
Substrate liquid processing apparatus
TOKYO ELECTRON LTD1 citations52
US12148632B2Nov 19, 2024
Substrate processing apparatus and cleaning method of mist guard
TOKYO ELECTRON LTD0 citations51
US9953852B2Apr 24, 2018
Liquid processing aparatus
TOKYO ELECTRON LTD1 citations51
US9793142B2Oct 17, 2017
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD1 citations51
US11158525B2Oct 26, 2021
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations49
US10475671B2Nov 12, 2019
Substrate processing apparatus and method of cleaning substrate processing apparatus
TOKYO ELECTRON LTD0 citations42
US10486208B2Nov 26, 2019
Substrate processing apparatus, method of cleaning substrate processing apparatus, and storage medium
TOKYO ELECTRON LTD0 citations41
US9818626B2Nov 14, 2017
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations40
HIGASHIJIMA JIRO
17 patentsUS9355871B2May 31, 2016
Substrate liquid processing apparatus for separating processing solution and atmosphere from each other within collection cup
HIGASHIJIMA JIRO8 citations84
US8696863B2Apr 15, 2014
Liquid processing apparatus and liquid processing method
HIGASHIJIMA JIRO8 citations83
US8607807B2Dec 17, 2013
Liquid treatment apparatus and method
HIGASHIJIMA JIRO7 citations82
US9048269B2Jun 2, 2015
Substrate liquid treatment apparatus with lift pin plate
HIGASHIJIMA JIRO6 citations73
US8887741B2Nov 18, 2014
Liquid processing apparatus, liquid processing method and storage medium
HIGASHIJIMA JIRO6 citations73
US8905051B2Dec 9, 2014
Liquid processing apparatus and liquid processing method
HIGASHIJIMA JIRO2 citations62
US8741099B2Jun 3, 2014
Liquid processing apparatus
HIGASHIJIMA JIRO2 citations62
US8567339B2Oct 29, 2013
Liquid processing apparatus
HIGASHIJIMA JIRO4 citations61
US9159594B2Oct 13, 2015
Liquid processing apparatus and liquid processing method
HIGASHIJIMA JIRO1 citations52
US8409482B2Apr 2, 2013
Porous member
HIGASHIJIMA JIRO0 citations52
US8313536B2Nov 20, 2012
Functional member having surface cleanliness
HIGASHIJIMA JIRO0 citations52
US9396975B2Jul 19, 2016
Liquid treatment apparatus and method
HIGASHIJIMA JIRO1 citations51
US9190311B2Nov 17, 2015
Liquid arm cleaning unit for substrate processing apparatus
HIGASHIJIMA JIRO1 citations51
US9022045B2May 5, 2015
Substrate liquid cleaning apparatus with controlled liquid port ejection angle
HIGASHIJIMA JIRO0 citations41
US8944081B2Feb 3, 2015
Liquid processing apparatus and liquid processing method
HIGASHIJIMA JIRO0 citations41
US8298344B2Oct 30, 2012
Method of processing workpieces using a vessel with a low pressure space surrounding a processing space for the purpose of preventing the leakage of atmosphere into the processing space
HIGASHIJIMA JIRO0 citations41
US8590547B2Nov 26, 2013
Liquid processing apparatus
HIGASHIJIMA JIRO0 citations40