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Inventor
TOOYAMA MASAYUKI
JP
2 patents
Patents
2 patents
US6706826B1
Mar 16, 2004
Copolymer, process for producing the same, and resist composition
MITSUBISHI RAYON CO
37 citations
90
US6887646B1
May 3, 2005
Chemical amplification resist composition
MITSUBISHI RAYON CO
19 citations
89