Inventor
RAI RAGHAW S
US2 patents
Patents
2 patentsUS7611936B2Nov 3, 2009
Method to control uniformity/composition of metal electrodes, silicides on topography and devices using this method
FREESCALE SEMICONDUCTOR INC2 citations58
US7563700B2Jul 21, 2009
Method for improving self-aligned silicide extendibility with spacer recess using an aggregated spacer recess etch (ASRE) integration
FREESCALE SEMICONDUCTOR INC6 citations54