Inventor
ISHIDUKA KEITA
JP20 patents
⚠️ This page may combine multiple inventors who share the name “ISHIDUKA KEITA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
8 patentsUS7713679B2May 11, 2010
Resist composition, method of forming resist pattern, novel compound, and acid generator
TOKYO OHKA KOGYO CO LTD57 citations98
US7527909B2May 5, 2009
Resist composition
TOKYO OHKA KOGYO CO LTD9 citations84
US7501220B2Mar 10, 2009
Resist composition
TOKYO OHKA KOGYO CO LTD9 citations84
US7776510B2Aug 17, 2010
Resist composition, method of forming resist pattern, compound and acid generator
TOKYO OHKA KOGYO CO LTD14 citations83
US7541138B2Jun 2, 2009
Resist composition
TOKYO OHKA KOGYO CO LTD6 citations73
US7488568B2Feb 10, 2009
Resist composition, method of forming resist pattern, compound and acid generator
TOKYO OHKA KOGYO CO LTD7 citations73
US7745097B2Jun 29, 2010
Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD4 citations63
US7955777B2Jun 7, 2011
Compound, acid generator, resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD4 citations62
KAWAUE AKIYA
2 patentsHADA HIDEO
2 patentsUS9034556B2May 19, 2015
Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern
HADA HIDEO2 citations60
US9040220B2May 26, 2015
Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern
HADA HIDEO0 citations50
ISHIDUKA KEITA
2 patentsUS8278025B2Oct 2, 2012
Material for forming resist protection films and method for resist pattern formation with the same
ISHIDUKA KEITA0 citations46
US8409781B2Apr 2, 2013
Composition for formation of resist protection film, and method for formation of resist pattern using the same
ISHIDUKA KEITA0 citations35