Inventor
LABRAKE DWAYNE L
US28 patents
⚠️ This page may combine multiple inventors who share the name “LABRAKE DWAYNE L”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
3M INNOVATIVE PROPERTIES CO
10 patentsUS6600866B2Jul 29, 2003
Filament organizer
3M INNOVATIVE PROPERTIES CO227 citations98
US6404956B1Jun 11, 2002
Long-length continuous phase Bragg reflectors in optical media
3M INNOVATIVE PROPERTIES CO92 citations96
US6195484B1Feb 27, 2001
Method and apparatus for arbitrary spectral shaping of an optical pulse
3M INNOVATIVE PROPERTIES CO73 citations95
US6035083AMar 7, 2000
Method for writing arbitrary index perturbations in a wave-guiding structure
3M INNOVATIVE PROPERTIES CO54 citations95
US5912999AJun 15, 1999
Method for fabrication of in-line optical waveguide index grating of any length
3M INNOVATIVE PROPERTIES CO71 citations93
US7106939B2Sep 12, 2006
Optical and optoelectronic articles
3M INNOVATIVE PROPERTIES CO15 citations92
US6532327B1Mar 11, 2003
Refractive index grating manufacturing process
3M INNOVATIVE PROPERTIES CO30 citations89
US6728444B2Apr 27, 2004
Fabrication of chirped fiber bragg gratings of any desired bandwidth using frequency modulation
3M INNOVATIVE PROPERTIES CO10 citations72
US6917750B2Jul 12, 2005
System and method for characterizing optical devices
3M INNOVATIVE PROPERTIES CO2 citations62
US7466892B2Dec 16, 2008
Optical and optoelectronic articles
3M INNOVATIVE PROPERTIES CO0 citations52
CANON KK
6 patentsUS10580659B2Mar 3, 2020
Planarization process and apparatus
CANON KK3 citations73
US10304690B2May 28, 2019
Fluid dispense methodology and apparatus for imprint lithography
CANON KK2 citations73
US10606171B2Mar 31, 2020
Superstrate and a method of using the same
CANON KK1 citations62
US10859913B2Dec 8, 2020
Superstrate and a method of using the same
CANON KK0 citations52
US10211051B2Feb 19, 2019
Method of reverse tone patterning
CANON KK0 citations42
US10079152B1Sep 18, 2018
Method for forming planarized etch mask structures over existing topography
CANON KK0 citations42
MOLECULAR IMPRINTS INC
4 patentsUS8361371B2Jan 29, 2013
Extrusion reduction in imprint lithography
MOLECULAR IMPRINTS INC16 citations90
US7256131B2Aug 14, 2007
Method of controlling the critical dimension of structures formed on a substrate
MOLECULAR IMPRINTS INC18 citations84
US8361546B2Jan 29, 2013
Facilitating adhesion between substrate and patterned layer
MOLECULAR IMPRINTS INC11 citations82
US7795132B2Sep 14, 2010
Self-aligned cross-point memory fabrication
MOLECULAR IMPRINTS INC2 citations61