Inventor
NITO HIDETO
JP18 patents
⚠️ This page may combine multiple inventors who share the name “NITO HIDETO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
11 patentsUS9851637B2Dec 26, 2017
Resist composition, method of forming resist pattern, compound, and acid diffusion control agent
TOKYO OHKA KOGYO CO LTD7 citations83
US11099479B2Aug 24, 2021
Resist composition, method of forming resist pattern, polymeric compound, and copolymer
TOKYO OHKA KOGYO CO LTD2 citations71
US10180625B2Jan 15, 2019
Resist composition, method of forming resist pattern, compound, and acid diffusion control agent
TOKYO OHKA KOGYO CO LTD1 citations62
US9405200B2Aug 2, 2016
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD2 citations62
US9029070B2May 12, 2015
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD3 citations62
US9678423B2Jun 13, 2017
Resist composition, method for forming resist pattern, acid generator and compound
TOKYO OHKA KOGYO CO LTD0 citations51
US9494866B2Nov 15, 2016
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations51
US9097969B2Aug 4, 2015
Compound, resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations51
US9023585B2May 5, 2015
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations51
US9377685B2Jun 28, 2016
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations41
US8956800B2Feb 17, 2015
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations41
SHIMIZU HIROAKI
3 patentsUS8323869B2Dec 4, 2012
Positive resist composition and method of forming resist pattern
SHIMIZU HIROAKI8 citations83
US8790868B2Jul 29, 2014
Method of forming resist pattern and negative tone-development resist composition
SHIMIZU HIROAKI0 citations41
US9005872B2Apr 14, 2015
Resist composition and method of forming resist pattern
SHIMIZU HIROAKI0 citations40
SHIONO DAIJU
2 patentsUS8221956B2Jul 17, 2012
Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound
SHIONO DAIJU20 citations91
US8475997B2Jul 2, 2013
Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound
SHIONO DAIJU2 citations61