P

Inventor

LIN CHIN-LUNG

TW61 patents
⚠️ This page may combine multiple inventors who share the name “LIN CHIN-LUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

UNITED MICROELECTRONICS CORP

26 patents
US6303252B1Oct 16, 2001

Reticle having assist feature between semi-dense lines

UNITED MICROELECTRONICS CORP181 citations99
US6472108B1Oct 29, 2002

Optical proximity correction method

UNITED MICROELECTRONICS CORP32 citations93
US6120953ASep 19, 2000

Method of optical proximity correction

UNITED MICROELECTRONICS CORP18 citations93
US6251564B1Jun 26, 2001

Method for forming a pattern with both logic-type and memory-type circuit

UNITED MICROELECTRONICS CORP22 citations92
US6165693ADec 26, 2000

Method of designing an assist feature

UNITED MICROELECTRONICS CORP22 citations92
US6598218B2Jul 22, 2003

Optical proximity correction method

UNITED MICROELECTRONICS CORP16 citations84
US8977988B2Mar 10, 2015

Method of optical proximity correction for modifying line patterns and integrated circuits with line patterns modified by the same

UNITED MICROELECTRONICS CORP5 citations78
US9009633B2Apr 14, 2015

Method of correcting assist feature

UNITED MICROELECTRONICS CORP11 citations76
US6576486B2Jun 10, 2003

Unlanded process in semiconductor manufacture

UNITED MICROELECTRONICS CORP8 citations74
US6482559B2Nov 19, 2002

Method of optical proximity correction

UNITED MICROELECTRONICS CORP9 citations74
US6406819B1Jun 18, 2002

Method for selective PSM with assist OPC

UNITED MICROELECTRONICS CORP12 citations74
US6265121B1Jul 24, 2001

Method of optical proximity correction

UNITED MICROELECTRONICS CORP11 citations74
US6064485AMay 16, 2000

Method of optical proximity correction

UNITED MICROELECTRONICS CORP6 citations74
US6016201AJan 18, 2000

Inspection method for a correction pattern

UNITED MICROELECTRONICS CORP8 citations74
US6013397AJan 11, 2000

Method for automatically forming a phase shifting mask

UNITED MICROELECTRONICS CORP14 citations74
US9679901B1Jun 13, 2017

Semiconductor device and manufacturing method thereof

UNITED MICROELECTRONICS CORP6 citations72
US10985166B2Apr 20, 2021

Method of forming a memory device

UNITED MICROELECTRONICS CORP3 citations71
US6312856B1Nov 6, 2001

Half-tone phase shift mask for fabrication of poly line

UNITED MICROELECTRONICS CORP4 citations63
US6291112B1Sep 18, 2001

Method of automatically forming a rim phase shifting mask

UNITED MICROELECTRONICS CORP2 citations63
US11800702B2Oct 24, 2023

Method of forming a memory device

UNITED MICROELECTRONICS CORP0 citations61
US10969687B2Apr 6, 2021

Method for forming patterns

UNITED MICROELECTRONICS CORP1 citations61
US9502285B1Nov 22, 2016

Method of forming trenches

UNITED MICROELECTRONICS CORP2 citations60
US7312020B2Dec 25, 2007

Lithography method

UNITED MICROELECTRONICS CORP6 citations58
US7008732B2Mar 7, 2006

Photomask pattern

UNITED MICROELECTRONICS CORP2 citations58
US7116815B2Oct 3, 2006

Chrome-less mask inspection method

UNITED MICROELECTRONICS CORP1 citations52
US6087049AJul 11, 2000

Mixed mode photomask for optical proximity correction in a lithographic process

UNITED MICROELECTRONICS CORP0 citations52

DEXIN CORP

9 patents

MEDIATEK INC

4 patents

(unassigned)

2 patents

IND TECH RES INST

2 patents

DEXIN ELECTRONIC LTD

2 patents

UNITED MICROELECTRONIC CORP

1 patent

TAIWAN SEMICONDUCTOR MFG

1 patent

LIN CHIN-LUNG

1 patent

LIN CHIN LUNG

1 patent

PROLIFIC TECHNOLOGY INC

1 patent

Showing the top 50 of 61 patents by PatentIndex Score.