Inventor
ARDALAN PENDAR
US2 patents
Patents
2 patentsUS9324571B2Apr 26, 2016
Post treatment for dielectric constant reduction with pore generation on low K dielectric films
APPLIED MATERIALS INC1 citations47
US9165998B2Oct 20, 2015
Adhesion layer to minimize dielectric constant increase with good adhesion strength in a PECVD process
APPLIED MATERIALS INC0 citations47