Inventor

HACKL TOBIAS

DE2 patents

Patents

2 patents

US8546776B2Oct 1, 2013

Optical system for EUV lithography with a charged-particle source

ZEISS CARL SMT GMBH1 citations49

US9921483B2Mar 20, 2018

Surface correction of mirrors with decoupling coating

ZEISS CARL SMT GMBH1 citations46