Inventor
MORIYA SHUJI
JP40 patents
⚠️ This page may combine multiple inventors who share the name “MORIYA SHUJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
18 patentsUS5494522AFeb 27, 1996
Plasma process system and method
TOKYO ELECTRON LTD90 citations95
US5439026AAug 8, 1995
Processing apparatus and flow control arrangement therefor
TOKYO ELECTRON LTD81 citations95
US5578129ANov 26, 1996
Gas supplying head and load lock chamber of semiconductor processing system
TOKYO ELECTRON LTD37 citations92
US5441076AAug 15, 1995
Processing apparatus using gas
TOKYO ELECTRON LTD51 citations92
US5307568AMay 3, 1994
Gas supply system
TOKYO ELECTRON LTD51 citations92
US9236272B2Jan 12, 2016
Etching apparatus and etching method
TOKYO ELECTRON LTD3 citations73
US5421365AJun 6, 1995
Flow control apparatus
TOKYO ELECTRON LTD15 citations73
US6346425B1Feb 12, 2002
Vapor-phase processing method capable of eliminating particle formation
TOKYO ELECTRON LTD8 citations72
US5294280AMar 15, 1994
Gas measuring device and processing apparatus provided with the gas measuring device
TOKYO ELECTRON LTD9 citations72
US10786837B2Sep 29, 2020
Method for cleaning chamber of substrate processing apparatus
TOKYO ELECTRON LTD3 citations71
US7862638B2Jan 4, 2011
Gas supply system for semiconductor manufacturing apparatus
TOKYO ELECTRON LTD2 citations63
US7682843B2Mar 23, 2010
Semiconductor fabrication system, and flow rate correction method and program for semiconductor fabrication system
TOKYO ELECTRON LTD5 citations62
US9012331B2Apr 21, 2015
Etching method and non-transitory storage medium
TOKYO ELECTRON LTD3 citations57
US8893743B2Nov 25, 2014
Flow rate controller and processing apparatus
TOKYO ELECTRON LTD2 citations56
US9371946B2Jun 21, 2016
Pipe joint
TOKYO ELECTRON LTD0 citations52
US10312101B2Jun 4, 2019
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations51
US9691630B2Jun 27, 2017
Etching method
TOKYO ELECTRON LTD1 citations51
US11761075B2Sep 19, 2023
Substrate cleaning apparatus
TOKYO ELECTRON LTD0 citations50
CANON KK
13 patentsUS6516166B2Feb 4, 2003
Image fixing apparatus
CANON KK25 citations93
US7251441B2Jul 31, 2007
Developing apparatus including magnetic field generating means, for use with a developer which includes a magnetic toner component
CANON KK13 citations84
US7239831B2Jul 3, 2007
Image forming apparatus when a maximum developing bias voltage |V| max and surface potential Vd of a charged image bearing member satisfy: |V| max≦|Vd|
CANON KK16 citations84
US6738593B2May 18, 2004
Developing device with developer bearing member overlying developer containing chamber
CANON KK19 citations84
US9026011B2May 5, 2015
Image forming apparatus
CANON KK7 citations83
US7379693B2May 27, 2008
Developing apparatus
CANON KK14 citations83
US7233758B2Jun 19, 2007
Developing apparatus featuring a developer carrying member with an elastic surface layer
CANON KK9 citations74
US6614004B2Sep 2, 2003
Heater including heat dissipation resistor on substrate and image heating apparatus equipped with the heater
CANON KK12 citations74
US7734205B2Jun 8, 2010
Image forming apparatus
CANON KK3 citations62
US7440718B2Oct 21, 2008
Developing apparatus featuring image defect supression
CANON KK5 citations62
US7383003B2Jun 3, 2008
Developing apparatus for preventing ghost images and uneven image density
CANON KK4 citations62
US8019260B2Sep 13, 2011
Image forming apparatus
CANON KK1 citations52
US7962076B2Jun 14, 2011
Image forming apparatus
CANON KK1 citations52
MORIYA SHUJI
3 patentsUS8210022B2Jul 3, 2012
Pressure type flow rate control reference and corrosion resistant pressure type flow rate controller used for the same
MORIYA SHUJI9 citations82
US8104516B2Jan 31, 2012
Gas supply unit and gas supply system
MORIYA SHUJI8 citations82
US9150965B2Oct 6, 2015
Processing apparatus
MORIYA SHUJI1 citations51