Inventor

SENZAKI TAKAHIRO

JP33 patents

⚠️ This page may combine multiple inventors who share the name “SENZAKI TAKAHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SENZAKI TAKAHIRO

TOKYO OHKA KOGYO CO LTD

Method for manufacturing laminate, and laminate

Photosensitive resin composition, photosensitive resin laminate, and method for pattern forming

Two-component treatment agent, treatment method for making metal surface antibacterial and antibacterial treatment agent

Surface treatment liquid and hydrophilizing treatment method

Surface treatment liquid, surface treatment method, and method for producing surface-treated roll-shaped sheet

Surface treatment liquid and hydrophilic treatment method

Surface treatment liquid and surface treatment method

Curable composition, antifogging coating agent, and cured film

Gas separation method and gas separation membrane

Polymerizable composition and hydrophilizing treatment method

Surface treatment liquid and surface treatment method

Method for manufacturing flow path device

Hydrophilic treatment method and surface treatment liquid

Surface treatment method, anti-static agent, and hydrophilizing treatment agent

Method for producing a fiber having a pattern on the surface thereof

Method for producing a fiber having a pattern on a surface thereof

Method of forming contact hole pattern

Block copolymer-containing composition and method of reducing pattern

Surface treatment liquid

Photosensitive resin composition for forming cell culture substrate

Undercoat agent and method of forming pattern of layer containing block copolymer

Undercoat agent, and pattern formation method for layer containing block copolymer

SENZAKI TAKAHIRO

Primer and pattern forming method for layer including block copolymer

Solvent developable negative resist composition, resist pattern formation method, and method for forming pattern of layer including block copolymer

Photosensitive resin composition, and pattern formation method using the same

Photosensitive resin composition and pattern forming method using the same

WASHIO YASUSHI

Chemically amplified positive-type photoresist composition for thick film, chemically amplified dry film for thick film, and method for production of thick film resist pattern

Resin composition and coating method using the same

FUJIKAWA SHIGENORI

Substrate provided with metal nanostructure on surface thereof and method of producing the same

Method for producing substrate having surface nanostructure

YAMANOUCHI ATSUSHI

Method of forming precision microspace, process for manufacturing member with precision microspace, and photosensitive laminated film

RIKEN

Method of forming fine pattern, and developer

NANOMEMBRANE TECHNOLOGIES INC

Gas-permeable membrane