Inventor

WANG DEYAN

US65 patents

⚠️ This page may combine multiple inventors who share the name “WANG DEYAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WANG DEYAN

ROHM & HAAS ELECT MAT

Coating compositions for photoresists

Compositions and processes for immersion lithography

Leveler compounds

Leveler compounds

Metal hardmask compositions

Compositions and processes for photolithography

Compositions and processes for immersion lithography

Organoaluminum materials for forming aluminum oxide layer from coating composition that contains organic solvent

Methods and compositions for removal of metal hardmasks

Hardmask

Polyarylene materials

Anti-reflective coating

Compositions and processes for photolithography

Photoresist topcoat compositions and methods of processing photoresist compositions

Hardmask surface treatment

Acoustic wave sensors and methods of sensing a gas-phase analyte

Optically clear shear thickening fluids and optical display device comprising same

UV-curing resin compositions for hard coat applications

Polymers for display devices

Compositions comprising sulfonamide material and processes for photolithography

Compositions and processes for immersion lithography

Compositions and processes for photolithography

Coating compositions and methods of forming electronic devices

Photoresist topcoat compositions and methods of processing photoresist compositions

Photoresist compositions and methods of forming photolithographic patterns

WANG DEYAN

Compositions and processes for photolithography

Compositions and processes for immersion lithography

Compositions and processes for immersion lithography

Compositons and processes for immersion lithography

Leveler compounds

Compositions and processes for immersion lithography

Surface active additive and photoresist composition comprising same

Compositions and processes for photolithography

Leveler compounds

Compositions comprising base-reactive component and processes for photolithography

Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography

Coating compositions for photoresists

Compositions and processes for photolithography

Compositions comprising sulfonamide material and processes for photolithography

Compositions comprising carboxy component and processes for photolithography

Compositions and processes for photolithography

Compositions and processes for photolithography

Compositions and processes for photolithography

SHIPLEY CO LLC

Leveler compounds

AQAD EMAD

Base reactive photoacid generators and photoresists comprising same

DOW GLOBAL TECHNOLOGIES LLC

Neutral layer polymers, methods of manufacture thereof and articles comprising the same

ROHM AND HAAS ELECTRONICS MATERIALS LLC

Hardmask surface treatment

Rohm and Hass Electronic Materials LLC

Photoresist and coated substrate comprising same

BAE YOUNG CHEOL

Photoresist compositions and methods of forming photolithographic patterns

CAPORALE STEFAN J

Compositions and processes for immersion lithography