Inventor

WASHINGTON LORI D

US27 patents

⚠️ This page may combine multiple inventors who share the name “WASHINGTON LORI D”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WASHINGTON LORI D

APPLIED MATERIALS INC

Multi-gas straight channel showerhead

Method for CVD process control for enhancing device performance

Backside heating chamber for emissivity independent thermal processes

Parasitic particle suppression in growth of III-V nitride films using MOCVD and HVPE

Methods for forming a transistor

Method of decontamination of process chamber after in-situ chamber clean

Pre-cleaning of substrates in epitaxy chambers

Multi-gas straight channel showerhead

Method for CVD process control for enhancing device performance

Movable central reflectors of semiconductor processing equipment, and related systems and methods

Stress measurement and stress balance in films

Method for measuring precursor amounts in bubbler sources

Methods for forming a transistor

Methods for forming a transistor

Susceptor improvement

Low mass substrate support

ALTA DEVICES INC

Tiled showerhead for a semiconductor chemical vapor deposition reactor

Methods for chemical vapor deposition (CVD) in a movable liner assembly

Methods of manufacturing optoelectronic devices using different growth substrates

Growth structure under a release layer for manufacturing of optoelectronic devices

HIGASHI GREGG

Tiled showerhead for a semiconductor chemical vapor deposition reactor

CVD reactor with gas flow virtual walls

Movable liner assembly for a deposition zone in a CVD reactor

UTICA LEASECO LLC

Methods for high growth rate deposition for forming different cells on a wafer

Optoelectronic devices manufactured using different growth substrates

BURROWS BRIAN H

Multi-gas straight channel showerhead

WASHINGTON LORI D

Method of high growth rate deposition for group III/V materials