Inventor
VAN BOXTEL FRANK JOHANNES JACOBUS
NL31 patents
⚠️ This page may combine multiple inventors who share the name “VAN BOXTEL FRANK JOHANNES JACOBUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
18 patentsUS10222707B2Mar 5, 2019
Lithographic apparatus and a device manufacturing method
ASML NETHERLANDS BV3 citations72
US9939740B2Apr 10, 2018
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV2 citations71
US10394139B2Aug 27, 2019
Patterning device cooling apparatus
ASML NETHERLANDS BV2 citations68
US9513568B2Dec 6, 2016
Lithographic apparatus
ASML NETHERLANDS BV2 citations61
US10495986B2Dec 3, 2019
Patterning device cooling system and method of thermally conditioning a patterning device
ASML NETHERLANDS BV1 citations60
US11036148B2Jun 15, 2021
Patterning device cooling system and method of thermally conditioning a patterning device
ASML NETHERLANDS BV0 citations59
US10495985B2Dec 3, 2019
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV1 citations58
US10788763B2Sep 29, 2020
Lithographic apparatus
ASML NETHERLANDS BV0 citations51
US10642166B2May 5, 2020
Patterning device cooling apparatus
ASML NETHERLANDS BV0 citations48
US10114295B2Oct 30, 2018
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations48
US10345717B2Jul 9, 2019
Lithographic apparatus and method
ASML NETHERLANDS BV0 citations47
US9977348B2May 22, 2018
Lithographic apparatus and method
ASML NETHERLANDS BV1 citations47
US11048178B2Jun 29, 2021
Lithographic apparatus with improved patterning performance
ASML NETHERLANDS BV0 citations46
US10114299B2Oct 30, 2018
Lithographic apparatus
ASML NETHERLANDS BV0 citations46
US11009800B2May 18, 2021
Measurement system, lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations45
US11762304B2Sep 19, 2023
Lithographic apparatus
ASML NETHERLANDS BV0 citations44
US10133197B2Nov 20, 2018
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations36
US10031428B2Jul 24, 2018
Gas flow optimization in reticle stage environment
ASML NETHERLANDS BV0 citations35
ASML HOLDING NV
4 patentsUS9632434B2Apr 25, 2017
Reticle cooling system in a lithographic apparatus
ASML HOLDING NV3 citations70
US9632433B2Apr 25, 2017
Patterning device support, lithographic apparatus, and method of controlling patterning device temperature
ASML HOLDING NV2 citations70
US9766557B2Sep 19, 2017
Patterning device support, lithographic apparatus, and method of controlling patterning device temperature
ASML HOLDING NV1 citations60
US9977351B2May 22, 2018
Patterning device support, lithographic apparatus, and method of controlling patterning device temperature
ASML HOLDING NV0 citations50
VAN BOXTEL FRANK JOHANNES JACOBUS
4 patentsUS9811007B2Nov 7, 2017
Lithographic apparatus and method of cooling a component in a lithographic apparatus
VAN BOXTEL FRANK JOHANNES JACOBUS2 citations67
US8675169B2Mar 18, 2014
Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method
VAN BOXTEL FRANK JOHANNES JACOBUS4 citations66
US8675170B2Mar 18, 2014
Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method
VAN BOXTEL FRANK JOHANNES JACOBUS0 citations42
US8988657B2Mar 24, 2015
Lithographic apparatus and device manufacturing method
VAN BOXTEL FRANK JOHANNES JACOBUS0 citations41