Inventor
DOBASHI KAZUYA
US27 patents
⚠️ This page may combine multiple inventors who share the name “DOBASHI KAZUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
18 patentsUS7383841B2Jun 10, 2008
Method of cleaning substrate-processing device and substrate-processing device
TOKYO ELECTRON LTD10 citations83
US9960056B2May 1, 2018
Substrate cleaning method, substrate cleaning apparatus and vacuum processing system
TOKYO ELECTRON LTD10 citations82
US9881815B2Jan 30, 2018
Substrate cleaning method, substrate cleaning device, and vacuum processing device
TOKYO ELECTRON LTD4 citations72
US10786837B2Sep 29, 2020
Method for cleaning chamber of substrate processing apparatus
TOKYO ELECTRON LTD3 citations71
US10381233B2Aug 13, 2019
Method and apparatus for substrate processing
TOKYO ELECTRON LTD5 citations68
US11517943B2Dec 6, 2022
Cleaning method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations62
US12165848B2Dec 10, 2024
Substrate processing method, substrate processing apparatus, and method for producing nanowire or nanosheet transistor
TOKYO ELECTRON LTD0 citations59
US12172198B2Dec 24, 2024
Gas cluster processing device and gas cluster processing method
TOKYO ELECTRON LTD0 citations58
US11865590B2Jan 9, 2024
Substrate cleaning method, processing container cleaning method, and substrate processing device
TOKYO ELECTRON LTD0 citations58
US11504751B2Nov 22, 2022
Substrate cleaning method, processing container cleaning method, and substrate processing device
TOKYO ELECTRON LTD0 citations58
US11267021B2Mar 8, 2022
Gas cluster processing device and gas cluster processing method
TOKYO ELECTRON LTD0 citations58
US11772138B2Oct 3, 2023
Processing apparatus and processing method, and gas cluster generating apparatus and gas cluster generating method
TOKYO ELECTRON LTD0 citations52
US11446714B2Sep 20, 2022
Processing apparatus and processing method, and gas cluster generating apparatus and gas cluster generating method
TOKYO ELECTRON LTD0 citations52
US10163622B2Dec 25, 2018
Substrate cleaning method, substrate processing method, substrate processing system and semiconductor device manufacturing method
TOKYO ELECTRON LTD0 citations52
US11761075B2Sep 19, 2023
Substrate cleaning apparatus
TOKYO ELECTRON LTD0 citations50
US7923680B2Apr 12, 2011
Analysis method and analysis apparatus
TOKYO ELECTRON LTD0 citations47
US10049899B2Aug 14, 2018
Substrate cleaning apparatus
TOKYO ELECTRON LTD0 citations39
US9875915B2Jan 23, 2018
Method for removing metal contamination and apparatus for removing metal contamination
TOKYO ELECTRON LTD0 citations36