Inventor
NISHINO MASARU
JP17 patents
⚠️ This page may combine multiple inventors who share the name “NISHINO MASARU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
10 patentsUS7674393B2Mar 9, 2010
Etching method and apparatus
TOKYO ELECTRON LTD15 citations92
US8986493B2Mar 24, 2015
Etching apparatus
TOKYO ELECTRON LTD5 citations83
US8361275B2Jan 29, 2013
Etching apparatus
TOKYO ELECTRON LTD14 citations83
US7279427B2Oct 9, 2007
Damage-free ashing process and system for post low-k etch
TOKYO ELECTRON LTD18 citations83
US7637269B1Dec 29, 2009
Low damage method for ashing a substrate using CO2/CO-based process
TOKYO ELECTRON LTD17 citations80
US8896210B2Nov 25, 2014
Plasma processing apparatus and method
TOKYO ELECTRON LTD10 citations79
US9305817B2Apr 5, 2016
Method for purging a substrate container
TOKYO ELECTRON LTD13 citations78
US7998872B2Aug 16, 2011
Method for etching a silicon-containing ARC layer to reduce roughness and CD
TOKYO ELECTRON LTD3 citations60
US6986851B2Jan 17, 2006
Dry developing method
TOKYO ELECTRON LTD0 citations47
US9653317B2May 16, 2017
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations39