Inventor
MESSINA JR MICHAEL D
US2 patents
Patents
2 patentsUS8052908B2Nov 8, 2011
Photolithographic mask exhibiting enhanced light transmission due to utilizing sub-wavelength aperture arrays for imaging patterns in nano-lithography
UNIV MARYLAND8 citations81
US8054450B2Nov 8, 2011
Stepper system for ultra-high resolution photolithography using photolithographic mask exhibiting enhanced light transmission due to utilizing sub-wavelength aperture arrays
UNIV MARYLAND6 citations70