Inventor
TATSUMI TETSUYA
JP22 patents
⚠️ This page may combine multiple inventors who share the name “TATSUMI TETSUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SONY CORP
15 patentsUS5200028AApr 6, 1993
Etching process of silicon material
SONY CORP55 citations96
US5378311AJan 3, 1995
Method of producing semiconductor device
SONY CORP84 citations95
US5368686ANov 29, 1994
Dry etching method for W polycide using sulfur deposition
SONY CORP45 citations92
US5362361ANov 8, 1994
Dry etching method
SONY CORP30 citations92
US5354421AOct 11, 1994
Dry etching method
SONY CORP23 citations92
US5266154ANov 30, 1993
Dry etching method
SONY CORP43 citations92
US5180464AJan 19, 1993
Dry etching method
SONY CORP29 citations92
US5660681AAug 26, 1997
Method for removing sidewall protective film
SONY CORP40 citations91
US7473646B2Jan 6, 2009
Dry etching method and production method of magnetic memory device
SONY CORP8 citations83
US5227341AJul 13, 1993
Method of manufacturing a semiconductor device using an isopropyl alcohol ashing step
SONY CORP11 citations73
US5211790AMay 18, 1993
Dry etching method by sulfur conditioning
SONY CORP17 citations73
US7439068B2Oct 21, 2008
Plasma monitoring method, plasma processing method, method of manufacturing semiconductor device, and plasma processing system
SONY CORP2 citations62
US8747685B2Jun 10, 2014
Shape simulation apparatus, shape simulation program, semiconductor production apparatus, and semiconductor device production method
SONY CORP0 citations52
US7808026B2Oct 5, 2010
Dry etching method and production method of magnetic memory device
SONY CORP1 citations51
US9287097B2Mar 15, 2016
Predicting ultraviolet ray damage with visible wavelength spectroscopy during a semiconductor manufacturing process
SONY CORP0 citations41
KUBOI NOBUYUKI
4 patentsUS8535550B2Sep 17, 2013
Shape simulation apparatus, shape simulation program, semiconductor production apparatus, and semiconductor device production method
KUBOI NOBUYUKI2 citations62
US10998174B2May 4, 2021
Dry etching equipment and method for producing semiconductor device
KUBOI NOBUYUKI0 citations51
US9411914B2Aug 9, 2016
Simulator, processing system, damage evaluation method and damage evaluation program
KUBOI NOBUYUKI0 citations40
US8649893B2Feb 11, 2014
Semiconductor manufacturing device, semiconductor device manufacturing method, simulation device, and simulation program
KUBOI NOBUYUKI0 citations40
SONY SEMICONDUCTOR SOLUTIONS CORP
2 patentsUS10403516B2Sep 3, 2019
Etching characteristic estimation method, program, information processing apparatus, processing apparatus, designing method, and production method
SONY SEMICONDUCTOR SOLUTIONS CORP1 citations62
US12062548B2Aug 13, 2024
Etching method for oxide semiconductor film
SONY SEMICONDUCTOR SOLUTIONS CORP0 citations56