Inventor
CHAO KEITH
US7 patents
Patents
7 patentsUS5663017ASep 2, 1997
Optical corrective techniques with reticle formation and reticle stitching to provide design flexibility
LSI LOGIC CORP78 citations95
US6109775AAug 29, 2000
Method for adjusting the density of lines and contact openings across a substrate region for improving the chemical-mechanical polishing of a thin-film later disposed thereon
LSI LOGIC CORP60 citations93
US5549934AAug 27, 1996
Process of curing hydrogen silsesquioxane coating to form silicon oxide layer
LSI LOGIC CORP24 citations92
US5456952AOct 10, 1995
Process of curing hydrogen silsesquioxane coating to form silicon oxide layer
LSI LOGIC CORP26 citations92
US6713386B1Mar 30, 2004
Method of preventing resist poisoning in dual damascene structures
LSI LOGIC CORP17 citations89
US5652163AJul 29, 1997
Use of reticle stitching to provide design flexibility
LSI LOGIC CORP17 citations72
US6969683B2Nov 29, 2005
Method of preventing resist poisoning in dual damascene structures
LSI LOGIC CORP3 citations60