P

Inventor

NAKANO MOTOO

JP28 patents
⚠️ This page may combine multiple inventors who share the name “NAKANO MOTOO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FUJITSU LTD

23 patents
US4262340AApr 14, 1981

Semiconductor memory device

FUJITSU LTD206 citations99
US4375993AMar 8, 1983

Method of producing a semiconductor device by simultaneous multiple laser annealing

FUJITSU LTD84 citations96
US5331180AJul 19, 1994

Porous semiconductor light emitting device

FUJITSU LTD44 citations95
US4425700AJan 17, 1984

Semiconductor device and method for manufacturing the same

FUJITSU LTD39 citations93
US5427977AJun 27, 1995

Method for manufacturing porous semiconductor light emitting device

FUJITSU LTD34 citations92
US4841349AJun 20, 1989

Semiconductor photodetector device with light responsive PN junction gate

FUJITSU LTD48 citations92
US4669062AMay 26, 1987

Two-tiered dynamic random access memory (DRAM) cell

FUJITSU LTD26 citations92
US4788473ANov 29, 1988

Plasma generating device with stepped waveguide transition

FUJITSU LTD33 citations91
US5250465AOct 5, 1993

Method of manufacturing semiconductor devices

FUJITSU LTD41 citations89
US4503315AMar 5, 1985

Semiconductor device with fuse

FUJITSU LTD19 citations82
US5648676AJul 15, 1997

Semiconductor device with protective element

FUJITSU LTD14 citations74
US4727043AFeb 23, 1988

Method of manufacturing a non-volatile memory

FUJITSU LTD17 citations74
US4538166AAug 27, 1985

Semiconductor memory device

FUJITSU LTD16 citations74
US4461072AJul 24, 1984

Method for preparing an insulated gate field effect transistor

FUJITSU LTD6 citations74
US4350536ASep 21, 1982

Method of producing dynamic random-access memory cells

FUJITSU LTD19 citations74
US4806769AFeb 21, 1989

Disk exchangeable target mechanism with effective cooling means, for ion implantation system

FUJITSU LTD12 citations73
US4258077AMar 24, 1981

Method of ion implantation into a semiconductor substrate provided with an insulating film

FUJITSU LTD12 citations73
US4275093AJun 23, 1981

Method of manufacturing insulated gate semiconductor devices by high pressure thermal oxidation with water vapor

FUJITSU LTD8 citations72
US5670885ASep 23, 1997

Semiconductor device

FUJITSU LTD2 citations63
US4541074ASep 10, 1985

Semiconductor device for memory cell

FUJITSU LTD4 citations63
US4454525AJun 12, 1984

IGFET Having crystal orientation near (944) to minimize white ribbon

FUJITSU LTD2 citations63
US6251743B1Jun 26, 2001

Method of liquid treatment of microstructures comprising bendable structural members

FUJITSU LTD2 citations62
US5652167AJul 29, 1997

Method of liquid treatment of micro-structures comprising structural members liable to be bent

FUJITSU LTD1 citations62

NEC CORP

3 patents

JAPAN TOBACCO INC

1 patent

FUJITSU LIMITED & FUJITSU VLSI

1 patent