Inventor
SESHIMO TAKEHIRO
US45 patents
⚠️ This page may combine multiple inventors who share the name “SESHIMO TAKEHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
27 patentsUS7713679B2May 11, 2010
Resist composition, method of forming resist pattern, novel compound, and acid generator
TOKYO OHKA KOGYO CO LTD57 citations98
US7682772B2Mar 23, 2010
Resist composition, method of forming resist pattern, novel compound, and acid generator
TOKYO OHKA KOGYO CO LTD20 citations92
US7927780B2Apr 19, 2011
Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator
TOKYO OHKA KOGYO CO LTD9 citations83
US7776510B2Aug 17, 2010
Resist composition, method of forming resist pattern, compound and acid generator
TOKYO OHKA KOGYO CO LTD14 citations83
US9169421B2Oct 27, 2015
Method of producing structure containing phase-separated structure, method of forming pattern, and top coat material
TOKYO OHKA KOGYO CO LTD7 citations82
US11542397B2Jan 3, 2023
Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device
TOKYO OHKA KOGYO CO LTD2 citations73
US9644110B2May 9, 2017
Method of producing structure containing phase-separated structure and method of forming top coat film
TOKYO OHKA KOGYO CO LTD2 citations73
US9567477B2Feb 14, 2017
Undercoat agent and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD4 citations73
US7488568B2Feb 10, 2009
Resist composition, method of forming resist pattern, compound and acid generator
TOKYO OHKA KOGYO CO LTD7 citations73
US8007981B2Aug 30, 2011
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD5 citations63
US7745097B2Jun 29, 2010
Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD4 citations63
US11912889B2Feb 27, 2024
Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer
TOKYO OHKA KOGYO CO LTD0 citations62
US11377522B2Jul 5, 2022
Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica-based coating, and production method for silicon-containing polymer
TOKYO OHKA KOGYO CO LTD0 citations62
US9442371B2Sep 13, 2016
Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern
TOKYO OHKA KOGYO CO LTD2 citations62
US9206307B2Dec 8, 2015
Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern
TOKYO OHKA KOGYO CO LTD2 citations62
US7955777B2Jun 7, 2011
Compound, acid generator, resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD4 citations62
US12024579B2Jul 2, 2024
Curable liquid composition, particulate filler, and compound
TOKYO OHKA KOGYO CO LTD0 citations56
US11222781B2Jan 11, 2022
Method for removing organic cured film on substrate, and acidic cleaning liquid
TOKYO OHKA KOGYO CO LTD0 citations52
US9188869B2Nov 17, 2015
Method of producing structure containing phase-separation structure, method of forming pattern, and method of forming fine pattern
TOKYO OHKA KOGYO CO LTD1 citations52
US9012129B2Apr 21, 2015
Resist composition, method of forming resist pattern, novel compound, and acid generator
TOKYO OHKA KOGYO CO LTD0 citations52
US9914847B2Mar 13, 2018
Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations51
US8367299B2Feb 5, 2013
Resist composition, method of forming resist pattern, compound and acid generator
TOKYO OHKA KOGYO CO LTD1 citations51
US11261299B2Mar 1, 2022
Block copolymer and method of producing the same, and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations49
US10941253B2Mar 9, 2021
Block copolymer, and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations46
US10179866B2Jan 15, 2019
Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations40
US9850350B2Dec 26, 2017
Block copolymer, method of producing block copolymer, and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations40
US9828519B2Nov 28, 2017
Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations40
UTSUMI YOSHIYUKI
4 patentsUS8415082B2Apr 9, 2013
Resist composition, method of forming resist pattern, compound and method of producing the same, acid generator
UTSUMI YOSHIYUKI8 citations84
US8765352B2Jul 1, 2014
Resist composition, method of forming resist pattern, novel compound, and acid generator
UTSUMI YOSHIYUKI4 citations73
US8609320B2Dec 17, 2013
Resist composition, method of forming resist pattern, polymeric compound and compound
UTSUMI YOSHIYUKI0 citations52
US8252509B2Aug 28, 2012
Resist composition and method of forming resist pattern
UTSUMI YOSHIYUKI0 citations41
SESHIMO TAKEHIRO
4 patentsUS8206891B2Jun 26, 2012
Positive resist composition and method of forming resist pattern
SESHIMO TAKEHIRO10 citations83
US8124313B2Feb 28, 2012
Resist composition, method of forming resist pattern, novel compound, and acid generator
SESHIMO TAKEHIRO11 citations83
US8298748B2Oct 30, 2012
Positive resist composition, method of forming resist pattern, and polymeric compound
SESHIMO TAKEHIRO2 citations60
US8932795B2Jan 13, 2015
Resist composition, method of forming resist pattern, novel compound, and acid generator
SESHIMO TAKEHIRO2 citations58
UNIV TEXAS
4 patentsUS9314819B2Apr 19, 2016
Anhydride copolymer top coats for orientation control of thin film block copolymers
UNIV TEXAS1 citations48
US9157008B2Oct 13, 2015
Anhydride copolymer top coats for orientation control of thin film block copolymers
UNIV TEXAS1 citations48
US10167410B2Jan 1, 2019
Using chemical vapor deposited films to control domain orientation in block copolymer thin films
UNIV TEXAS0 citations46
US9040121B2May 26, 2015
Using chemical vapor deposited films to control domain orientation in block copolymer thin films
UNIV TEXAS0 citations45