Inventor
ARAI IZUMI
JP24 patents
⚠️ This page may combine multiple inventors who share the name “ARAI IZUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
10 patentsUS4931135AJun 5, 1990
Etching method and etching apparatus
TOKYO ELECTRON LTD449 citations99
US5382311AJan 17, 1995
Stage having electrostatic chuck and plasma processing apparatus using same
TOKYO ELECTRON LTD1,031 citations98
US6110287AAug 29, 2000
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD397 citations97
US5203958AApr 20, 1993
Processing method and apparatus
TOKYO ELECTRON LTD55 citations96
US4978412ADec 18, 1990
Plasma processing device
TOKYO ELECTRON LTD61 citations96
US4963713AOct 16, 1990
Cooling of a plasma electrode system for an etching apparatus
TOKYO ELECTRON LTD55 citations96
US5155331AOct 13, 1992
Method for cooling a plasma electrode system for an etching apparatus
TOKYO ELECTRON LTD23 citations92
US5089083AFeb 18, 1992
Plasma etching method
TOKYO ELECTRON LTD53 citations92
US5164034ANov 17, 1992
Apparatus and method for processing substrate
TOKYO ELECTRON LTD15 citations74
US5858258AJan 12, 1999
Plasma processing method
TOKYO ELECTRON LTD4 citations63
ASM IP HOLDING BV
5 patentsUS9640416B2May 2, 2017
Single-and dual-chamber module-attachable wafer-handling chamber
ASM IP HOLDING BV485 citations99
US9343350B2May 17, 2016
Anti-slip end effector for transporting workpiece using van der waals force
ASM IP HOLDING BV472 citations99
US9349620B2May 24, 2016
Apparatus and method for pre-baking substrate upstream of process chamber
ASM IP HOLDING BV472 citations96
US10679879B2Jun 9, 2020
Substrate processing apparatus
ASM IP HOLDING BV2 citations73
US10403523B2Sep 3, 2019
Substrate processing apparatus
ASM IP HOLDING BV4 citations73