Inventor
GRUMBINE STEVEN K
US26 patents
⚠️ This page may combine multiple inventors who share the name “GRUMBINE STEVEN K”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CABOT MICROELECTRONICS CORP
18 patentsUS6582623B1Jun 24, 2003
CMP composition containing silane modified abrasive particles
CABOT MICROELECTRONICS CORP143 citations98
US6646348B1Nov 11, 2003
Silane containing polishing composition for CMP
CABOT MICROELECTRONICS CORP48 citations96
US6383065B1May 7, 2002
Catalytic reactive pad for metal CMP
CABOT MICROELECTRONICS CORP51 citations96
US6867140B2Mar 15, 2005
Method of polishing a multi-layer substrate
CABOT MICROELECTRONICS CORP20 citations92
US6855266B1Feb 15, 2005
Polishing system with stopping compound and method of its use
CABOT MICROELECTRONICS CORP26 citations92
US6852632B2Feb 8, 2005
Method of polishing a multi-layer substrate
CABOT MICROELECTRONICS CORP33 citations92
US6830503B1Dec 14, 2004
Catalyst/oxidizer-based CMP system for organic polymer films
CABOT MICROELECTRONICS CORP38 citations92
US6705926B2Mar 16, 2004
Boron-containing polishing system and method
CABOT MICROELECTRONICS CORP38 citations92
US6685540B2Feb 3, 2004
Polishing pad comprising particles with a solid core and polymeric shell
CABOT MICROELECTRONICS CORP35 citations92
US6592776B1Jul 15, 2003
Polishing composition for metal CMP
CABOT MICROELECTRONICS CORP30 citations92
US7732393B2Jun 8, 2010
Oxidation-stabilized CMP compositions and methods
CABOT MICROELECTRONICS CORP8 citations84
US7316603B2Jan 8, 2008
Compositions and methods for tantalum CMP
CABOT MICROELECTRONICS CORP16 citations84
US7001253B2Feb 21, 2006
Boron-containing polishing system and method
CABOT MICROELECTRONICS CORP11 citations79
US7093722B2Aug 22, 2006
Polishing composition storage container
CABOT MICROELECTRONICS CORP9 citations74
US6767476B2Jul 27, 2004
Polishing composition for metal CMP
CABOT MICROELECTRONICS CORP9 citations73
US7501346B2Mar 10, 2009
Gallium and chromium ions for oxide rate enhancement
CABOT MICROELECTRONICS CORP2 citations63
US7311856B2Dec 25, 2007
Polymeric inhibitors for enhanced planarization
CABOT MICROELECTRONICS CORP4 citations63
US7497938B2Mar 3, 2009
Tribo-chronoamperometry as a tool for CMP application
CABOT MICROELECTRONICS CORP0 citations42
CABOT CORP
6 patentsUS6068787AMay 30, 2000
Composition and slurry useful for metal CMP
CABOT CORP189 citations99
US5980775ANov 9, 1999
Composition and slurry useful for metal CMP
CABOT CORP144 citations99
US5958288ASep 28, 1999
Composition and slurry useful for metal CMP
CABOT CORP219 citations99
US6136711AOct 24, 2000
Polishing composition including an inhibitor of tungsten etching
CABOT CORP163 citations98
US6015506AJan 18, 2000
Composition and method for polishing rigid disks
CABOT CORP127 citations98
US6083419AJul 4, 2000
Polishing composition including an inhibitor of tungsten etching
CABOT CORP101 citations97