Inventor

WANG SHUMIN

US55 patents

⚠️ This page may combine multiple inventors who share the name “WANG SHUMIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WANG SHUMIN

CABOT MICROELECTRONICS CORP

Chemical mechanical polishing slurry useful for copper/tantalum substrates

Chemical mechanical polishing slurry useful for copper substrates

CMP composition containing silane modified abrasive particles

CMP slurry containing a solid catalyst

Silane containing polishing composition for CMP

CMP polishing pad including a solid catalyst

Chemical mechanical polishing slurry useful for copper substrates

Cleaning solution for semiconductor surfaces following chemical-mechanical polishing

Composition for oxide CMP

Chemical mechanical polishing slurry useful for copper/tantalum substrates

Chemical mechanical polishing systems and methods for their use

Cleaning solution for semiconductor surfaces following chemical-mechanical polishing

Method for polishing a substrate using a CMP slurry

Method of polishing using multi-oxidizer slurry

Compositions for oxide CMP

Method for polishing a memory or rigid disk with a phosphate ion-containing polishing system

Method of polishing a multi-layer substrate

Polishing system with stopping compound and method of its use

Method of polishing a multi-layer substrate

Polishing composition for metal CMP

Chemical mechanical polishing slurry useful for copper substrates

Method for polishing a memory or rigid disk with an amino acid-containing composition

Method for polishing a memory or rigid disk with an oxidized halide-containing polishing system

Chemical mechanical polishing method useful for copper substrates

Chemical-mechanical polishing method

Chemical mechanical polishing slurry useful for copper substrates

Polishing composition containing conducting polymer

Coated metal oxide particles for CMP

Chemical mechanical polishing slurry useful for copper substrates

Composition and method for polishing rigid disks

Composition and method for polishing rigid disks

Polishing composition for metal CMP

Method of polishing a substrate with a polishing system containing conducting polymer

CABOT CORP

Chemical mechanical polishing slurry useful for copper/tantalum substrate

Multi-oxidizer slurry for chemical mechanical polishing

Multi-oxidizer precursor for chemical mechanical polishing

Multi-oxidizer slurry for chemical mechanical polishing

WANG SHUMIN

Monolithic integrated lattice mismatched crystal template and preparation method thereof

Chemical mechanical polishing systems and methods for their use

Method for preparing graphene

BYD CO LTD

PTC electric heating assembly, electric heating device and electric vehicle

Defroster and a vehicle having the same

UNIV CHINA AGRICULTURAL

Method for ameliorating or avoiding the adverse effects of exogenous gonadotropins on reproductive performance

Methods of administering vitamin A and lactic acid to gilts

UNIV AUBURN

Parallel plate transmission line for broadband nuclear magnetic resonance imaging

KORETSKY ALAN P

Transmit profile control in MRI

GE MED SYS GLOBAL TECH CO LLC

Phase controlled surface coil magnetic resonance imaging

AURORA CANNABIS ENTPR INC

Methods of determining sensitivity to photoperiod in cannabis

UNIV PEKING THIRD HOSPITAL

Fluorescent contrast agent with targeting function, and preparation method and use thereof

ANJI MICROELECTRONICS SHANGHAI

Composition for removing photoresist layer and method for using it