Inventor
MUNDT RANDALL S
US35 patents
⚠️ This page may combine multiple inventors who share the name “MUNDT RANDALL S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LAM RES CORP
14 patentsUS5463526AOct 31, 1995
Hybrid electrostatic chuck
LAM RES CORP111 citations98
US5846373ADec 8, 1998
Method for monitoring process endpoints in a plasma chamber and a process monitoring arrangement in a plasma chamber
LAM RES CORP221 citations97
US5200232AApr 6, 1993
Reaction chamber design and method to minimize particle generation in chemical vapor deposition reactors
LAM RES CORP132 citations97
US5644400AJul 1, 1997
Method and apparatus for determining the center and orientation of a wafer-like object
LAM RES CORP62 citations96
US5472565ADec 5, 1995
Topology induced plasma enhancement for etched uniformity improvement
LAM RES CORP53 citations94
US5718511AFeb 17, 1998
Temperature mapping method
LAM RES CORP22 citations92
US5654796AAug 5, 1997
Apparatus and method for mapping plasma characteristics
LAM RES CORP24 citations92
US6642063B2Nov 4, 2003
Apparatus for characterization of microelectronic feature quality
LAM RES CORP16 citations91
US6432729B1Aug 13, 2002
Method for characterization of microelectronic feature quality
LAM RES CORP28 citations91
US5368646ANov 29, 1994
Reaction chamber design to minimize particle generation in chemical vapor deposition reactors
LAM RES CORP23 citations91
US5791850AAug 11, 1998
Vacuum compatible fastener and fastening system
LAM RES CORP19 citations86
US6582619B1Jun 24, 2003
Methods and apparatuses for trench depth detection and control
LAM RES CORP13 citations84
US5702533ADec 30, 1997
Particulate free vacuum compatible pinch seal
LAM RES CORP19 citations83
US5714031AFeb 3, 1998
Topology induced plasma enhancement for etched uniformity improvement
LAM RES CORP11 citations71
KLA TENCOR CORP
5 patentsUS7531984B2May 12, 2009
Sensor apparatus power transfer, communication and maintenance methods and apparatus
KLA TENCOR CORP15 citations83
US7960670B2Jun 14, 2011
Methods of and apparatuses for measuring electrical parameters of a plasma process
KLA TENCOR CORP13 citations82
US7482576B2Jan 27, 2009
Apparatuses for and methods of monitoring optical radiation parameters for substrate processing operations
KLA TENCOR CORP8 citations81
US7722434B2May 25, 2010
Apparatus for measurement of parameters in process equipment
KLA TENCOR CORP5 citations63
US9029728B2May 12, 2015
Methods of and apparatuses for measuring electrical parameters of a plasma process
KLA TENCOR CORP0 citations50
ONWAFER TECHNOLOGIES INC
4 patentsUS6691068B1Feb 10, 2004
Methods and apparatus for obtaining data for process operation, optimization, monitoring, and control
ONWAFER TECHNOLOGIES INC148 citations98
US6542835B2Apr 1, 2003
Data collection methods and apparatus
ONWAFER TECHNOLOGIES INC90 citations98
US7282889B2Oct 16, 2007
Maintenance unit for a sensor apparatus
ONWAFER TECHNOLOGIES INC24 citations92
US6907364B2Jun 14, 2005
Methods and apparatus for deriving thermal flux data for processing a workpiece
ONWAFER TECHNOLOGIES INC41 citations91
NCR CO
4 patentsUS4571819AFeb 25, 1986
Method for forming trench isolation structures
NCR CO226 citations96
US4578128AMar 25, 1986
Process for forming retrograde dopant distributions utilizing simultaneous outdiffusion of dopants
NCR CO185 citations94
US4656497AApr 7, 1987
Trench isolation structures
NCR CO62 citations93
US4671970AJun 9, 1987
Trench filling and planarization process
NCR CO83 citations91
MUNDT RANDALL S
3 patentsUS5137701AAug 11, 1992
Apparatus and method for eliminating unwanted materials from a gas flow line
MUNDT RANDALL S62 citations95
US7127362B2Oct 24, 2006
Process tolerant methods and apparatus for obtaining data
MUNDT RANDALL S19 citations92
US8698037B2Apr 15, 2014
Methods of and apparatuses for maintenance, diagnosis, and optimization of processes
MUNDT RANDALL S3 citations60