P

Inventor

YOSHIOKA JUNICHIRO

JP26 patents
⚠️ This page may combine multiple inventors who share the name “YOSHIOKA JUNICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

EBARA CORP

20 patents
US6844274B2Jan 18, 2005

Substrate holder, plating apparatus, and plating method

EBARA CORP39 citations96
US7022211B2Apr 4, 2006

Semiconductor wafer holder and electroplating system for plating a semiconductor wafer

EBARA CORP47 citations95
US7601248B2Oct 13, 2009

Substrate holder and plating apparatus

EBARA CORP11 citations92
US6269548B1Aug 7, 2001

Spin processing apparatus

EBARA CORP22 citations92
US7402227B2Jul 22, 2008

Plating apparatus and method

EBARA CORP34 citations91
US6716332B1Apr 6, 2004

Plating method and apparatus

EBARA CORP31 citations91
US7833393B2Nov 16, 2010

Semiconductor wafer holder and electroplating system for plating a semiconductor wafer

EBARA CORP11 citations83
US6365020B1Apr 2, 2002

Wafer plating jig

EBARA CORP14 citations82
US7901551B2Mar 8, 2011

Substrate holder and plating apparatus

EBARA CORP5 citations73
US7807027B2Oct 5, 2010

Substrate holder, plating apparatus, and plating method

EBARA CORP6 citations73
US9714476B2Jul 25, 2017

Semiconductor wafer holder and electroplating system for plating a semiconductor wafer

EBARA CORP2 citations72
US9624596B2Apr 18, 2017

Electrochemical deposition method

EBARA CORP3 citations72
US6500317B1Dec 31, 2002

Plating apparatus for detecting the conductivity between plating contacts on a substrate

EBARA CORP8 citations72
US9388505B2Jul 12, 2016

Electrochemical deposition method

EBARA CORP1 citations62
US8936705B2Jan 20, 2015

Electrochemical deposition apparatus

EBARA CORP1 citations62
US8012332B2Sep 6, 2011

Plating apparatus and method

EBARA CORP4 citations61
US6242624B1Jun 5, 2001

Method for making alkanol-or alkane-sulfone plumbate

EBARA CORP4 citations57
US9593430B2Mar 14, 2017

Electrochemical deposition method

EBARA CORP1 citations51
US9506162B2Nov 29, 2016

Electrochemical deposition method

EBARA CORP0 citations51
US7118664B2Oct 10, 2006

Plating method and apparatus

EBARA CORP1 citations51

YOSHIOKA JUNICHIRO

4 patents

TOSHIBA KK

1 patent

JCU CORP

1 patent