Inventor
CHOU CHUN-LI
TW20 patents
⚠️ This page may combine multiple inventors who share the name “CHOU CHUN-LI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
11 patentsUS11923199B2Mar 5, 2024
Method and structure of middle layer removal
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11398380B2Jul 26, 2022
Method and structure of middle layer removal
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US9117760B2Aug 25, 2015
Method and system for energized and pressurized liquids for cleaning/etching applications in semiconductor manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations59
US12112953B2Oct 8, 2024
Semiconductor devices and methods of manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations58
US11776818B2Oct 3, 2023
Semiconductor devices and methods of manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations58
US10985028B1Apr 20, 2021
Semiconductor devices and methods of manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations58
US9728533B2Aug 8, 2017
Aqueous cleaning techniques and compositions for use in semiconductor device manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations51
US10658179B2May 19, 2020
Method and structure of middle layer removal
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US9048089B2Jun 2, 2015
Apparatus to improve internal wafer temperature profile
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
US10755972B2Aug 25, 2020
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations46
US10354913B2Jul 16, 2019
Chemical clean of semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations35
TAIWAN SEMICONDUCTOR MFG
6 patentsUS7968506B2Jun 28, 2011
Wet cleaning stripping of etch residue after trench and via opening formation in dual damascene process
TAIWAN SEMICONDUCTOR MFG20 citations92
US7713380B2May 11, 2010
Method and apparatus for backside polymer reduction in dry-etch process
TAIWAN SEMICONDUCTOR MFG18 citations92
US7022610B2Apr 4, 2006
Wet cleaning method to eliminate copper corrosion
TAIWAN SEMICONDUCTOR MFG14 citations84
US6864193B2Mar 8, 2005
Aqueous cleaning composition containing copper-specific corrosion inhibitor
TAIWAN SEMICONDUCTOR MFG9 citations73
US7373941B2May 20, 2008
Wet cleaning cavitation system and method to remove particulate wafer contamination
TAIWAN SEMICONDUCTOR MFG4 citations62
US6974505B2Dec 13, 2005
Tool for cleaning substrates
TAIWAN SEMICONDUCTOR MFG4 citations56