Inventor
WALLRAFF GREGORY MICHAEL
US35 patents
⚠️ This page may combine multiple inventors who share the name “WALLRAFF GREGORY MICHAEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
31 patentsUS7056840B2Jun 6, 2006
Direct photo-patterning of nanoporous organosilicates, and method of use
IBM153 citations99
US5665527ASep 9, 1997
Process for generating negative tone resist images utilizing carbon dioxide critical fluid
IBM138 citations98
US5658734AAug 19, 1997
Process for synthesizing chemical compounds
IBM306 citations97
US6962822B2Nov 8, 2005
Discrete nano-textured structures in biomolecular arrays, and method of use
IBM51 citations96
US6653048B2Nov 25, 2003
High silicon content monomers and polymers suitable for 193 nm bilayer resists
IBM30 citations96
US6610456B2Aug 26, 2003
Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions
IBM57 citations96
US6548219B2Apr 15, 2003
Substituted norbornene fluoroacrylate copolymers and use thereof in lithographic photoresist compositions
IBM67 citations96
US6444408B1Sep 3, 2002
High silicon content monomers and polymers suitable for 193 nm bilayer resists
IBM35 citations96
US6165678ADec 26, 2000
Lithographic photoresist composition and process for its use in the manufacture of integrated circuits
IBM59 citations96
US5985524ANov 16, 1999
Process for using bilayer photoresist
IBM77 citations96
US6509134B2Jan 21, 2003
Norbornene fluoroacrylate copolymers and process for the use thereof
IBM83 citations95
US6177228B1Jan 23, 2001
Photoresist composition and process for its use
IBM35 citations92
US5786131AJul 28, 1998
Process for use of photoresist composition with deep ultraviolet radiation
IBM28 citations92
US7193023B2Mar 20, 2007
Low activation energy photoresists
IBM11 citations84
US6730452B2May 4, 2004
Lithographic photoresist composition and process for its use
IBM17 citations84
US7288362B2Oct 30, 2007
Immersion topcoat materials with improved performance
IBM11 citations83
US6180317B1Jan 30, 2001
Composition for photoimaging
IBM16 citations82
US7651872B2Jan 26, 2010
Discrete nano-textured structures in biomolecular arrays, and method of use
IBM4 citations74
US7300741B2Nov 27, 2007
Advanced chemically amplified resist for sub 30 nm dense feature resolution
IBM7 citations73
USRE38282EOct 21, 2003
Process for using bilayer photoresist
IBM7 citations73
US5747223AMay 5, 1998
Composition for photoimaging
IBM11 citations72
US7585609B2Sep 8, 2009
Bilayer film including an underlayer having vertical acid transport properties
IBM5 citations71
US7820369B2Oct 26, 2010
Method for patterning a low activation energy photoresist
IBM3 citations63
US6627111B2Sep 30, 2003
Organic light emitting displays and new fluorescent compounds
IBM3 citations62
US7855045B2Dec 21, 2010
Immersion topcoat materials with improved performance
IBM2 citations61
US7160665B2Jan 9, 2007
Method for employing vertical acid transport for lithographic imaging applications
IBM4 citations60
US5866306AFeb 2, 1999
Process for use of photosensitive polysilanes as photoresist
IBM3 citations57
US7807340B2Oct 5, 2010
Photoresists for visible light imaging
IBM1 citations52
US7354692B2Apr 8, 2008
Photoresists for visible light imaging
IBM1 citations52
US7354777B2Apr 8, 2008
Discrete nano-textured structures in biomolecular arrays, and method of use
IBM0 citations52
US12488994B2Dec 2, 2025
Magnesium oxide based hardmask for reactive ion etching
IBM0 citations51