Inventor

TANAKA HATSUYUKI

JP40 patents

⚠️ This page may combine multiple inventors who share the name “TANAKA HATSUYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TANAKA HATSUYUKI

TOKYO OHKA KOGYO CO LTD

Method and liquid coating composition for the formation of silica-based coating film on substrate surface

Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant

Method for rinse treatment of a substrate

Negative-working radiation-sensitive resist composition

Remover solution for resist

Method for forming a resist pattern on a substrate surface and a scum-remover therefor

Method for forming a protective coating film on electronic parts and devices

Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant

Positive-working naphthoquinone diazide photoresist composition with two cresol novolac resins

Developer solution for actinic ray-sensitive resist

Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye

Developer solution for acitinic ray sensitive resist

Method and liquid coating composition for the formation of silica-based coating film on substrate surface

Developer solution for positive-working resist composition

Highly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturation

Method for forming a protective coating film on electronic parts and devices

Positive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atoms

Liquid coating composition

Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol

CLARIANT FINANCE BVI LTD

Water-soluble resin composition

Composition for anti-reflective coating or radiation absorbing coating and compounds used in the composition

Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating

Composition for reflection reducing coating

Composition for bottom reflection preventive film and novel polymeric dye for use in the same

Method for forming resist pattern

Composition for light absorption film formation containing blocked isocyanate compound and antireflection film formed therefrom

Composition for antireflection coating

Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating

Blocked isocyanate compound-containing composition for forming a radiation absorbing coating and anti-reflective coating formed therefrom

Radiation absorbing polymer and synthesis thereof

AZ ELECTRONIC MATERIALS USA

Etching method and composition for forming etching protective layer

Development defect preventing process and material

Method for forming pattern and treating agent for use therein

CLARIANT INT LTD

Antireflection or light-absorbing coating composition and polymer therefor

Light-absorbing polymers and application thereof to anti-reflection film

TOKYO OHTA KOGYO CO LTD

Developer solution for photoresist composition

HOECHST JAPAN

Composition for anti-reflection coating

TOYOTA MOTOR CO LTD

Clamp band

CLARIANT INTERNAITONAL LTD

Radiation-sensitive resist composition with high heat resistance

TOKYO OHKA KOBYO CO LTD

Positive-working photoresist composition containing quinone diazide compound, novolak resin and alkyl pyruvate solvent