P

Inventor

YONEKAWA MASAMI

JP20 patents
⚠️ This page may combine multiple inventors who share the name “YONEKAWA MASAMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CANON KK

19 patents
US5184176AFeb 2, 1993

Projection exposure apparatus with an aberration compensation device of a projection lens

CANON KK66 citations94
US6088082AJul 11, 2000

Projection aligner and projection aligning method

CANON KK21 citations92
US5953106ASep 14, 1999

Projection optical system, exposure apparatus and semiconductor-device manufacturing method using the system

CANON KK41 citations91
US6330052B1Dec 11, 2001

Exposure apparatus and its control method, stage apparatus, and device manufacturing method

CANON KK33 citations89
US7193682B2Mar 20, 2007

Exposure apparatus and device manufacturing method

CANON KK14 citations83
US6741328B2May 25, 2004

Exposure apparatus and its control method, stage apparatus, and device manufacturing method

CANON KK14 citations80
US11798818B2Oct 24, 2023

Container, processing apparatus, particle removing method, and method of manufacturing article

CANON KK5 citations74
US6433351B1Aug 13, 2002

Exposure apparatus and control method for correcting an exposure optical system on the basis of an estimated magnification variation

CANON KK13 citations73
US5654792AAug 5, 1997

Projection exposure apparatus which determines the minimum number of shots to optimially expose the substrate surface

CANON KK7 citations73
US11036149B2Jun 15, 2021

Imprint apparatus, method of operating the same, and method of manufacturing article

CANON KK2 citations72
US10228624B2Mar 12, 2019

Lithography apparatus and article manufacturing method

CANON KK4 citations72
US7911588B2Mar 22, 2011

Exposure apparatus and original

CANON KK6 citations63
US12292368B2May 6, 2025

Evaluation method, substrate processing apparatus, manufacturing method of substrate processing apparatus and article manufacturing method

CANON KK0 citations62
US7670754B2Mar 2, 2010

Exposure apparatus having a processing chamber, a vacuum chamber and first and second load lock chambers

CANON KK5 citations62
US7319507B2Jan 15, 2008

Apparatus and method for removing contaminant on original, method of manufacturing device, and original

CANON KK2 citations62
US12157150B2Dec 3, 2024

Particle removal method, particle removal apparatus, and method for manufacturing article

CANON KK0 citations52
US9213231B2Dec 15, 2015

Reflective original, exposure method, and device manufacturing method

CANON KK0 citations52
US10444646B2Oct 15, 2019

Lithography apparatus and method of manufacturing article

CANON KK0 citations51
US10889052B2Jan 12, 2021

Imprint apparatus, method for manufacturing article, and exposure apparatus

CANON KK0 citations50

YONEKAWA MASAMI

1 patent