P

Inventor

IKUTA YOSHIAKI

JP41 patents
⚠️ This page may combine multiple inventors who share the name “IKUTA YOSHIAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ASAHI GLASS CO LTD

23 patents
US6576578B1Jun 10, 2003

Synthetic quartz glass and method for preparing the same

ASAHI GLASS CO LTD32 citations92
US6544914B1Apr 8, 2003

Synthetic quartz glass for optical member, process for producing the same, and method of using the same

ASAHI GLASS CO LTD29 citations92
US6499317B1Dec 31, 2002

Synthetic quartz glass and method for production thereof

ASAHI GLASS CO LTD32 citations92
US6475575B1Nov 5, 2002

Pellicle and method for manufacture thereof

ASAHI GLASS CO LTD24 citations89
US7230695B2Jun 12, 2007

Defect repair device and defect repair method

ASAHI GLASS CO LTD10 citations84
US7960077B2Jun 14, 2011

Reflective-type mask blank for EUV lithography

ASAHI GLASS CO LTD11 citations83
US9268207B2Feb 23, 2016

Reflective mask blank for EUV lithography, method of manufacturing thereof, reflective mask for EUV lithography and method of manufacturing thereof

ASAHI GLASS CO LTD6 citations73
US7678511B2Mar 16, 2010

Reflective-type mask blank for EUV lithography

ASAHI GLASS CO LTD6 citations73
US7022633B2Apr 4, 2006

Synthetic quartz glass and process for producing it

ASAHI GLASS CO LTD6 citations73
US6611317B1Aug 26, 2003

Exposure apparatus, semiconductor device, and photomask

ASAHI GLASS CO LTD11 citations73
US7514382B2Apr 7, 2009

Synthetic quartz glass for optical member and its production method

ASAHI GLASS CO LTD7 citations70
US7592063B2Sep 22, 2009

Quartz glass substrate and process for its production

ASAHI GLASS CO LTD3 citations63
US7527695B2May 5, 2009

Apparatus and method for cleaning substrate

ASAHI GLASS CO LTD6 citations63
US7901843B2Mar 8, 2011

Process for smoothing surface of glass substrate

ASAHI GLASS CO LTD5 citations62
US7712333B2May 11, 2010

Method for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography

ASAHI GLASS CO LTD2 citations61
US8916316B2Dec 23, 2014

Reflecting mask blank, method for manufacturing reflective mask blank and method for quality control for reflective mask blank

ASAHI GLASS CO LTD3 citations60
US7368403B2May 6, 2008

Synthetic quartz glass for optical member, projection exposure apparatus and projection exposure method

ASAHI GLASS CO LTD4 citations59
US7549141B2Jun 16, 2009

Photomask, photomask manufacturing method, and photomask processing device

ASAHI GLASS CO LTD6 citations57
US8052797B2Nov 8, 2011

Method for removing foreign matter from substrate surface

ASAHI GLASS CO LTD1 citations52
US7504185B2Mar 17, 2009

Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography

ASAHI GLASS CO LTD5 citations52
US8921017B2Dec 30, 2014

Multilayer substrate, manufacturing method for multilayer substrate, and quality control method for multilayer substrate

ASAHI GLASS CO LTD1 citations50
US9739722B2Aug 22, 2017

Reflective mask blank for EUV lithography, and process for its inspection and process for its production

ASAHI GLASS CO LTD0 citations42
US7784307B2Aug 31, 2010

Optical member made of synthetic quartz glass, and process for its production

ASAHI GLASS CO LTD0 citations41

GLORY KOGYO KK

3 patents

MITSUBISHI HEAVY IND LTD

2 patents

IKUTA YOSHIAKI

2 patents

ONCO THERAPY SCIENCE INC

2 patents

MIKAMI MASAKI

2 patents

AGC INC

1 patent

NISHIMURA YASUHARU

1 patent

SEMATECH INC

1 patent

UNIV KUMAMOTO

1 patent

RASTEGAR ABBAS

1 patent

NAKANISHI HIROSHI

1 patent

TAKEUCHI HISASHI

1 patent