Inventor
IKUTA YOSHIAKI
JP41 patents
⚠️ This page may combine multiple inventors who share the name “IKUTA YOSHIAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASAHI GLASS CO LTD
23 patentsUS6576578B1Jun 10, 2003
Synthetic quartz glass and method for preparing the same
ASAHI GLASS CO LTD32 citations92
US6544914B1Apr 8, 2003
Synthetic quartz glass for optical member, process for producing the same, and method of using the same
ASAHI GLASS CO LTD29 citations92
US6499317B1Dec 31, 2002
Synthetic quartz glass and method for production thereof
ASAHI GLASS CO LTD32 citations92
US6475575B1Nov 5, 2002
Pellicle and method for manufacture thereof
ASAHI GLASS CO LTD24 citations89
US7230695B2Jun 12, 2007
Defect repair device and defect repair method
ASAHI GLASS CO LTD10 citations84
US7960077B2Jun 14, 2011
Reflective-type mask blank for EUV lithography
ASAHI GLASS CO LTD11 citations83
US9268207B2Feb 23, 2016
Reflective mask blank for EUV lithography, method of manufacturing thereof, reflective mask for EUV lithography and method of manufacturing thereof
ASAHI GLASS CO LTD6 citations73
US7678511B2Mar 16, 2010
Reflective-type mask blank for EUV lithography
ASAHI GLASS CO LTD6 citations73
US7022633B2Apr 4, 2006
Synthetic quartz glass and process for producing it
ASAHI GLASS CO LTD6 citations73
US6611317B1Aug 26, 2003
Exposure apparatus, semiconductor device, and photomask
ASAHI GLASS CO LTD11 citations73
US7514382B2Apr 7, 2009
Synthetic quartz glass for optical member and its production method
ASAHI GLASS CO LTD7 citations70
US7592063B2Sep 22, 2009
Quartz glass substrate and process for its production
ASAHI GLASS CO LTD3 citations63
US7527695B2May 5, 2009
Apparatus and method for cleaning substrate
ASAHI GLASS CO LTD6 citations63
US7901843B2Mar 8, 2011
Process for smoothing surface of glass substrate
ASAHI GLASS CO LTD5 citations62
US7712333B2May 11, 2010
Method for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography
ASAHI GLASS CO LTD2 citations61
US8916316B2Dec 23, 2014
Reflecting mask blank, method for manufacturing reflective mask blank and method for quality control for reflective mask blank
ASAHI GLASS CO LTD3 citations60
US7368403B2May 6, 2008
Synthetic quartz glass for optical member, projection exposure apparatus and projection exposure method
ASAHI GLASS CO LTD4 citations59
US7549141B2Jun 16, 2009
Photomask, photomask manufacturing method, and photomask processing device
ASAHI GLASS CO LTD6 citations57
US8052797B2Nov 8, 2011
Method for removing foreign matter from substrate surface
ASAHI GLASS CO LTD1 citations52
US7504185B2Mar 17, 2009
Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography
ASAHI GLASS CO LTD5 citations52
US8921017B2Dec 30, 2014
Multilayer substrate, manufacturing method for multilayer substrate, and quality control method for multilayer substrate
ASAHI GLASS CO LTD1 citations50
US9739722B2Aug 22, 2017
Reflective mask blank for EUV lithography, and process for its inspection and process for its production
ASAHI GLASS CO LTD0 citations42
US7784307B2Aug 31, 2010
Optical member made of synthetic quartz glass, and process for its production
ASAHI GLASS CO LTD0 citations41
GLORY KOGYO KK
3 patentsMITSUBISHI HEAVY IND LTD
2 patentsIKUTA YOSHIAKI
2 patentsONCO THERAPY SCIENCE INC
2 patentsMIKAMI MASAKI
2 patentsUS8993201B2Mar 31, 2015
Reflective layer-equipped substrate for EUV lithography, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and process for production of the reflective layer-equipped substrate
MIKAMI MASAKI2 citations59
US8580465B2Nov 12, 2013
Multilayer mirror for EUV lithography and process for its production
MIKAMI MASAKI2 citations59