Inventor
OZAKI SHIGENORI
JP29 patents
⚠️ This page may combine multiple inventors who share the name “OZAKI SHIGENORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
21 patentsUS7226874B2Jun 5, 2007
Substrate processing method
TOKYO ELECTRON LTD24 citations92
US6897149B2May 24, 2005
Method of producing electronic device material
TOKYO ELECTRON LTD24 citations92
US7560396B2Jul 14, 2009
Material for electronic device and process for producing the same
TOKYO ELECTRON LTD10 citations84
US7723241B2May 25, 2010
Plasma processing method and computer storage medium
TOKYO ELECTRON LTD8 citations83
US7446052B2Nov 4, 2008
Method for forming insulation film
TOKYO ELECTRON LTD10 citations82
US7887637B2Feb 15, 2011
Method for cleaning treatment chamber in substrate treating apparatus and method for detecting endpoint of cleaning
TOKYO ELECTRON LTD7 citations81
US7429539B2Sep 30, 2008
Nitriding method of gate oxide film
TOKYO ELECTRON LTD7 citations74
US7232772B2Jun 19, 2007
Substrate processing method
TOKYO ELECTRON LTD7 citations74
US7217659B2May 15, 2007
Process for producing materials for electronic device
TOKYO ELECTRON LTD5 citations73
US8021987B2Sep 20, 2011
Method of modifying insulating film
TOKYO ELECTRON LTD3 citations62
US7662236B2Feb 16, 2010
Method for forming insulation film
TOKYO ELECTRON LTD3 citations62
US7655574B2Feb 2, 2010
Method of modifying insulating film
TOKYO ELECTRON LTD3 citations62
US7632758B2Dec 15, 2009
Process and apparatus for forming oxide film, and electronic device material
TOKYO ELECTRON LTD2 citations62
US7622402B2Nov 24, 2009
Method for forming underlying insulation film
TOKYO ELECTRON LTD2 citations62
US7897518B2Mar 1, 2011
Plasma processing method and computer storage medium
TOKYO ELECTRON LTD4 citations61
US12315700B2May 27, 2025
Plasma processing apparatus and ceiling wall
TOKYO ELECTRON LTD0 citations58
US11118265B2Sep 14, 2021
Film deposition method and computer program storage medium
TOKYO ELECTRON LTD0 citations52
US7713864B2May 11, 2010
Method of cleaning semiconductor substrate conductive layer surface
TOKYO ELECTRON LTD0 citations51
US9991097B2Jun 5, 2018
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations50
US10704073B2Jul 7, 2020
Method for determining undifferentiated state of pluripotent stem cells by culture medium analysis
TOKYO ELECTRON LTD0 citations34
US10370632B2Aug 6, 2019
Facility for culturing pluripotent stem cells
TOKYO ELECTRON LTD0 citations31