Inventor
MATSUYAMA SEIJI
JP24 patents
⚠️ This page may combine multiple inventors who share the name “MATSUYAMA SEIJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
16 patentsUS7226874B2Jun 5, 2007
Substrate processing method
TOKYO ELECTRON LTD24 citations92
US6897149B2May 24, 2005
Method of producing electronic device material
TOKYO ELECTRON LTD24 citations92
US7226848B2Jun 5, 2007
Substrate treating method and production method for semiconductor device
TOKYO ELECTRON LTD11 citations84
US7723241B2May 25, 2010
Plasma processing method and computer storage medium
TOKYO ELECTRON LTD8 citations83
US7446052B2Nov 4, 2008
Method for forming insulation film
TOKYO ELECTRON LTD10 citations82
US7429539B2Sep 30, 2008
Nitriding method of gate oxide film
TOKYO ELECTRON LTD7 citations74
US7250375B2Jul 31, 2007
Substrate processing method and material for electronic device
TOKYO ELECTRON LTD9 citations74
US7232772B2Jun 19, 2007
Substrate processing method
TOKYO ELECTRON LTD7 citations74
US7217659B2May 15, 2007
Process for producing materials for electronic device
TOKYO ELECTRON LTD5 citations73
US7517751B2Apr 14, 2009
Substrate treating method
TOKYO ELECTRON LTD2 citations63
US8021987B2Sep 20, 2011
Method of modifying insulating film
TOKYO ELECTRON LTD3 citations62
US7662236B2Feb 16, 2010
Method for forming insulation film
TOKYO ELECTRON LTD3 citations62
US7655574B2Feb 2, 2010
Method of modifying insulating film
TOKYO ELECTRON LTD3 citations62
US7622402B2Nov 24, 2009
Method for forming underlying insulation film
TOKYO ELECTRON LTD2 citations62
US7897518B2Mar 1, 2011
Plasma processing method and computer storage medium
TOKYO ELECTRON LTD4 citations61
US7759598B2Jul 20, 2010
Substrate treating method and production method for semiconductor device
TOKYO ELECTRON LTD0 citations52
LAM RES CORP
5 patentsUS10566187B2Feb 18, 2020
Ultrathin atomic layer deposition film accuracy thickness control
LAM RES CORP9 citations84
US12354871B2Jul 8, 2025
Ultrathin atomic layer deposition film accuracy thickness control
LAM RES CORP1 citations75
US11646198B2May 9, 2023
Ultrathin atomic layer deposition film accuracy thickness control
LAM RES CORP1 citations73
US11101129B2Aug 24, 2021
Ultrathin atomic layer deposition film accuracy thickness control
LAM RES CORP3 citations73
US11670503B2Jun 6, 2023
Method of atomic layer deposition
LAM RES CORP0 citations62