Inventor
FUJIWARA TOMONORI
JP15 patents
⚠️ This page may combine multiple inventors who share the name “FUJIWARA TOMONORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SCREEN HOLDINGS CO LTD
9 patentsUS10720333B2Jul 21, 2020
Substrate processing apparatus and substrate processing method
SCREEN HOLDINGS CO LTD2 citations72
US10058900B2Aug 28, 2018
Substrate processing apparatus and substrate processing method
SCREEN HOLDINGS CO LTD3 citations71
US11710629B2Jul 25, 2023
Substrate processing apparatus and substrate processing method
SCREEN HOLDINGS CO LTD0 citations61
US11342190B2May 24, 2022
Substrate processing apparatus and substrate processing method
SCREEN HOLDINGS CO LTD0 citations61
US11094529B2Aug 17, 2021
Substrate processing apparatus and substrate processing method
SCREEN HOLDINGS CO LTD0 citations61
US12271448B2Apr 8, 2025
Data processing method, data processing apparatus, and recording medium with data processing program recorded thereon
SCREEN HOLDINGS CO LTD0 citations59
US11829451B2Nov 28, 2023
Data processing method, data processing apparatus, and recording medium with data processing program recorded thereon
SCREEN HOLDINGS CO LTD0 citations59
US11243862B2Feb 8, 2022
Data processing method, data processing apparatus, and recording medium with data processing program recorded thereon
SCREEN HOLDINGS CO LTD0 citations59
US10199231B2Feb 5, 2019
Substrate processing apparatus and substrate processing method
SCREEN HOLDINGS CO LTD0 citations51
TOKYO ELECTRON LTD
6 patentsUS8021987B2Sep 20, 2011
Method of modifying insulating film
TOKYO ELECTRON LTD3 citations62
US7655574B2Feb 2, 2010
Method of modifying insulating film
TOKYO ELECTRON LTD3 citations62
US7622402B2Nov 24, 2009
Method for forming underlying insulation film
TOKYO ELECTRON LTD2 citations62
US7368384B2May 6, 2008
Film formation apparatus and method of using the same
TOKYO ELECTRON LTD4 citations61
US7084023B2Aug 1, 2006
Method of manufacturing semiconductor device, film-forming apparatus, and storage medium
TOKYO ELECTRON LTD5 citations61
US7041546B2May 9, 2006
Film forming method for depositing a plurality of high-k dielectric films
TOKYO ELECTRON LTD5 citations60