Inventor
KANDA HIROMI
JP45 patents
⚠️ This page may combine multiple inventors who share the name “KANDA HIROMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIFILM CORP
29 patentsUS7700260B2Apr 20, 2010
Pattern forming method
FUJIFILM CORP58 citations98
US8039197B2Oct 18, 2011
Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
FUJIFILM CORP11 citations92
US7998654B2Aug 16, 2011
Positive resist composition and pattern-forming method
FUJIFILM CORP16 citations92
US7611820B2Nov 3, 2009
Positive resist composition and pattern-forming method using the same
FUJIFILM CORP20 citations92
US7531287B2May 12, 2009
Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
FUJIFILM CORP20 citations92
US7504194B2Mar 17, 2009
Positive resist composition and pattern making method using the same
FUJIFILM CORP16 citations92
US8034537B2Oct 11, 2011
Positive resist composition and pattern forming method
FUJIFILM CORP12 citations84
US7892722B2Feb 22, 2011
Pattern forming method
FUJIFILM CORP9 citations84
US7790351B2Sep 7, 2010
Positive resist composition and pattern making method using the same
FUJIFILM CORP11 citations84
US7635554B2Dec 22, 2009
Positive resist composition and pattern forming method
FUJIFILM CORP13 citations84
US7368220B2May 6, 2008
Positive resist composition and pattern forming method using the same
FUJIFILM CORP11 citations84
US7316886B2Jan 8, 2008
Protective film-forming composition for immersion exposure and pattern-forming method using the same
FUJIFILM CORP14 citations84
US7273690B2Sep 25, 2007
Positive resist composition for immersion exposure and method of pattern formation with the same
FUJIFILM CORP17 citations84
US8362140B2Jan 29, 2013
Pigment-dispersed composition, colored photosensitive composition, photocurable composition, color filter, liquid crystal display device, and solid-state image pickup device
FUJIFILM CORP6 citations73
US7811740B2Oct 12, 2010
Positive resist composition and pattern-forming method using the same
FUJIFILM CORP6 citations73
US9541831B2Jan 10, 2017
Positive resist composition and method of pattern formation with the same
FUJIFILM CORP1 citations63
US8343708B2Jan 1, 2013
Positive resist composition and pattern forming method
FUJIFILM CORP2 citations63
US7947421B2May 24, 2011
Positive resist composition for immersion exposure and pattern-forming method using the same
FUJIFILM CORP2 citations63
US7842452B2Nov 30, 2010
Pattern forming method
FUJIFILM CORP2 citations63
US7803511B2Sep 28, 2010
Positive resist composition for immersion exposure and pattern-forming method using the same
FUJIFILM CORP5 citations63
US7785767B2Aug 31, 2010
Positive resist composition and pattern forming method using the same
FUJIFILM CORP3 citations63
US7771912B2Aug 10, 2010
Positive resist composition and pattern forming method using the same
FUJIFILM CORP4 citations63
US7666574B2Feb 23, 2010
Positive resist composition and pattern forming method
FUJIFILM CORP5 citations63
US7645557B2Jan 12, 2010
Positive resist composition for immersion exposure and pattern forming method using the same
FUJIFILM CORP4 citations63
US7550250B2Jun 23, 2009
Positive resist composition and pattern forming method using the same
FUJIFILM CORP5 citations63
US7482112B2Jan 27, 2009
Pattern forming method
FUJIFILM CORP2 citations63
US9709891B2Jul 18, 2017
Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
FUJIFILM CORP0 citations52
US9081279B2Jul 14, 2015
Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
FUJIFILM CORP0 citations52
US7906268B2Mar 15, 2011
Positive resist composition for immersion exposure and pattern-forming method using the same
FUJIFILM CORP1 citations52
KANDA HIROMI
10 patentsUS8426109B2Apr 23, 2013
Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
KANDA HIROMI12 citations92
US8080363B2Dec 20, 2011
Resin for hydrophobitizing resist surface, method for manufacturing the resin, and positive resist composition containing the resin
KANDA HIROMI26 citations92
US8871421B2Oct 28, 2014
Positive resist composition and method of pattern formation with the same
KANDA HIROMI10 citations79
US10678132B2Jun 9, 2020
Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resin
KANDA HIROMI2 citations73
US9057952B2Jun 16, 2015
Positive resist composition and method of pattern formation with the same
KANDA HIROMI1 citations62
US8741537B2Jun 3, 2014
Positive resist composition and pattern-forming method using the same
KANDA HIROMI2 citations62
US8697329B2Apr 15, 2014
Positive resist composition and pattern forming method using the same
KANDA HIROMI2 citations62
US8241833B2Aug 14, 2012
Positive resist composition and pattern-forming method using the same
KANDA HIROMI2 citations62
US8679724B2Mar 25, 2014
Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
KANDA HIROMI0 citations52
US9442372B2Sep 13, 2016
Pigment dispersion composition, photocurable composition and color filter
KANDA HIROMI0 citations41