Inventor
HUANG CHING-JUINN
TW16 patents
⚠️ This page may combine multiple inventors who share the name “HUANG CHING-JUINN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
15 patentsUS11984314B2May 14, 2024
Particle removal method
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US12124178B2Oct 22, 2024
Lithography system and method
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US11675280B2Jun 13, 2023
Lithography system and method
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US11062898B2Jul 13, 2021
Particle removal apparatus, particle removal system and particle removal method
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations71
US12354867B2Jul 8, 2025
Particle removal apparatus
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11106146B2Aug 31, 2021
Lithography system and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12292687B2May 6, 2025
Width adjustment of EUV radiation beam
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US12085861B2Sep 10, 2024
Control of dynamic gas lock flow inlets of an intermediate focus cap
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US11815821B2Nov 14, 2023
Module vessel with scrubber gutters sized to prevent overflow
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations59
US11796917B2Oct 24, 2023
Width adjustment of EUV radiation beam
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US11573495B2Feb 7, 2023
Control of dynamic gas lock flow inlets of an intermediate focus cap
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations59
US10663871B2May 26, 2020
Reticle stage and method for using the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US11221562B2Jan 11, 2022
Reticle and method of detecting intactness of reticle stage using the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US10684561B2Jun 16, 2020
Lithography method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US10678148B2Jun 9, 2020
Lithography system and lithography method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations40