P

Inventor

CHO JUN HYUN

KR25 patents
⚠️ This page may combine multiple inventors who share the name “CHO JUN HYUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

12 patents
US7270886B2Sep 18, 2007

Spin-on glass composition and method of forming silicon oxide layer in semiconductor manufacturing process using the same

SAMSUNG ELECTRONICS CO LTD34 citations92
US7605094B2Oct 20, 2009

Method of forming metal oxide using an atomic layer deposition process

SAMSUNG ELECTRONICS CO LTD8 citations84
US7427573B2Sep 23, 2008

Forming composite metal oxide layer with hafnium oxide and titanium oxide

SAMSUNG ELECTRONICS CO LTD6 citations73
US7648854B2Jan 19, 2010

Methods of forming metal oxide layers, methods of forming gate structures using the same, and methods of forming capacitors using the same

SAMSUNG ELECTRONICS CO LTD3 citations63
US7250379B2Jul 31, 2007

Method of forming metal oxide using an atomic layer deposition process

SAMSUNG ELECTRONICS CO LTD5 citations63
US7732297B2Jun 8, 2010

Method of manufacturing an insulating layer and method of manufacturing a semiconductor device using the insulating layer

SAMSUNG ELECTRONICS CO LTD3 citations62
US7517815B2Apr 14, 2009

Spin-on glass composition, method of preparing the spin-on glass composition and method of forming a porous silicon oxide layer using the spin-on glass composition

SAMSUNG ELECTRONICS CO LTD3 citations62
US7488684B2Feb 10, 2009

Organic aluminum precursor and method of forming a metal wire using the same

SAMSUNG ELECTRONICS CO LTD2 citations62
US7452569B2Nov 18, 2008

Organic aluminum precursor and method of manufacturing a metal wiring using the same

SAMSUNG ELECTRONICS CO LTD2 citations62
US7642200B2Jan 5, 2010

Methods of forming a thin film and methods of manufacturing a capacitor and a gate structure using the same

SAMSUNG ELECTRONICS CO LTD0 citations52
US7582573B2Sep 1, 2009

Spin-on glass composition and method of forming silicon oxide layer in semiconductor manufacturing process using the same

SAMSUNG ELECTRONICS CO LTD0 citations52
US9425059B2Aug 23, 2016

Methods of forming a pattern and methods of manufacturing a semiconductor device using the same

SAMSUNG ELECTRONICS CO LTD1 citations51

KOREA INST ENERGY RES

7 patents

KOREA ENERGY RESEARCH INST

3 patents

LEE JUNG-HO

1 patent

CHO YOUN-JOUNG

1 patent

SK HYNIX INC

1 patent