Inventor
UCHINO SHOUICHI
JP2 patents
Patents
2 patentsUS5290666AMar 1, 1994
Method of forming a positive photoresist pattern utilizing contrast enhancement overlayer containing trifluoromethanesulfonic, methanesulfonic or trifluoromethaneacetic aromatic diazonium salt
HITACHI LTD5 citations56
US4983500AJan 8, 1991
Radiation imaging process for formation of contrast enhanced pattern using two photosensitive dialonium salt layers with removal of overlayer and developed resist pattern in underlayer
HITACHI LTD0 citations37