P

Inventor

SHI LEATHEN

US52 patents
⚠️ This page may combine multiple inventors who share the name “SHI LEATHEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

43 patents
US6830962B1Dec 14, 2004

Self-aligned SOI with different crystal orientation using wafer bonding and SIMOX processes

IBM134 citations99
US6660598B2Dec 9, 2003

Method of forming a fully-depleted SOI ( silicon-on-insulator) MOSFET having a thinned channel region

IBM137 citations99
US5371654ADec 6, 1994

Three dimensional high performance interconnection package

IBM503 citations99
US8927968B2Jan 6, 2015

Accurate control of distance between suspended semiconductor nanowires and substrate surface

IBM87 citations98
US7087965B2Aug 8, 2006

Strained silicon CMOS on hybrid crystal orientations

IBM97 citations98
US6841831B2Jan 11, 2005

Fully-depleted SOI MOSFETs with low source and drain resistance and minimal overlap capacitance using a recessed channel damascene gate process

IBM74 citations98
US6224690B1May 1, 2001

Flip-Chip interconnections using lead-free solders

IBM191 citations98
US5531022AJul 2, 1996

Method of forming a three dimensional high performance interconnection package

IBM328 citations98
US6911375B2Jun 28, 2005

Method of fabricating silicon devices on sapphire with wafer bonding at low temperature

IBM64 citations96
US5062896ANov 5, 1991

Solder/polymer composite paste and method

IBM96 citations96
US7235812B2Jun 26, 2007

Method of creating defect free high Ge content (>25%) SiGe-on-insulator (SGOI) substrates using wafer bonding techniques

IBM41 citations94
US7217949B2May 15, 2007

Strained Si MOSFET on tensile-strained SiGe-on-insulator (SGOI)

IBM11 citations93
US6835633B2Dec 28, 2004

SOI wafers with 30-100 Å buried oxide (BOX) created by wafer bonding using 30-100 Å thin oxide as bonding layer

IBM24 citations93
US8030145B2Oct 4, 2011

Back-gated fully depleted SOI transistor

IBM23 citations92
US5764314AJun 9, 1998

Mechanical packaging and thermal management of flat mirror arrays

IBM20 citations92
US5721602AFeb 24, 1998

Mechanical packaging and thermal management of flat mirror arrays

IBM25 citations92
US5424634AJun 13, 1995

Non-destructive flex testing method and means

IBM120 citations92
US6399406B2Jun 4, 2002

Encapsulated MEMS band-pass filter for integrated circuits and method of fabrication thereof

IBM44 citations91
US6262464B1Jul 17, 2001

Encapsulated MEMS brand-pass filter for integrated circuits

IBM23 citations91
US6686630B2Feb 3, 2004

Damascene double-gate MOSFET structure and its fabrication method

IBM44 citations89
US7488630B2Feb 10, 2009

Method for preparing 2-dimensional semiconductor devices for integration in a third dimension

IBM9 citations84
US7767546B1Aug 3, 2010

Low cost fabrication of double box back gate silicon-on-insulator wafers with built-in shallow trench isolation in back gate layer

IBM12 citations83
US7402466B2Jul 22, 2008

Strained silicon CMOS on hybrid crystal orientations

IBM8 citations74
US7138683B2Nov 21, 2006

Self-aligned SOI with different crystal orientation using WAFER bonding and SIMOX processes

IBM6 citations74
US9536853B2Jan 3, 2017

Semiconductor device including built-in crack-arresting film structure

IBM3 citations73
US7704815B2Apr 27, 2010

Method of creating defect free high Ge content (>25%) SiGe-on-insulator (SGOI) substrates using wafer bonding techniques

IBM5 citations72
US7445977B2Nov 4, 2008

Method of creating defect free high Ge content (> 25%) SiGe-on-insulator (SGOI) substrates using wafer bonding techniques

IBM7 citations72
US5504375AApr 2, 1996

Asymmetric studs and connecting lines to minimize stress

IBM11 citations71
US7485518B2Feb 3, 2009

Strained Si MOSFET on tensile-strained SiGe-on-insulator (SGOI)

IBM6 citations70
US8927405B2Jan 6, 2015

Accurate control of distance between suspended semiconductor nanowires and substrate surface

IBM2 citations63
US7528056B2May 5, 2009

Low-cost strained SOI substrate for high-performance CMOS technology

IBM5 citations63
US7166521B2Jan 23, 2007

SOI wafers with 30-100 Å buried oxide (BOX) created by wafer bonding using 30-100 Å thin oxide as bonding layer

IBM2 citations63
US7897480B2Mar 1, 2011

Preparation of high quality strained-semiconductor directly-on-insulator substrates

IBM4 citations62
US7713837B2May 11, 2010

Low temperature fusion bonding with high surface energy using a wet chemical treatment

IBM2 citations60
US10615139B2Apr 7, 2020

Semiconductor device including built-in crack-arresting film structure

IBM0 citations52
US10211178B2Feb 19, 2019

Semiconductor device including built-in crack-arresting film structure

IBM0 citations52
US10020279B2Jul 10, 2018

Semiconductor device including built-in crack-arresting film structure

IBM0 citations52
US9865469B2Jan 9, 2018

Epitaxial lift-off process with guided etching

IBM1 citations52
US9653308B2May 16, 2017

Epitaxial lift-off process with guided etching

IBM0 citations52
US8017499B2Sep 13, 2011

Strained Si MOSFET on tensile-strained SiGe-on-insulator (SGOI)

IBM0 citations52
US7691688B2Apr 6, 2010

Strained silicon CMOS on hybrid crystal orientations

IBM0 citations52
US7521735B2Apr 21, 2009

Multiple layer and crystal plane orientation semiconductor substrate

IBM0 citations52
US7507989B2Mar 24, 2009

Strained Si MOSFET on tensile-strained SiGe-on-insulator (SGOI)

IBM0 citations52

DENNARD ROBERT H

3 patents

GLOBALFOUNDRIES INC

1 patent

COONEY III EDWARD C

1 patent

GUO DECHAO

1 patent

LEOBANDUNG EFFENDI

1 patent

Showing the top 50 of 52 patents by PatentIndex Score.