Inventor
PRECHTL GERHARD
AT67 patents
⚠️ This page may combine multiple inventors who share the name “PRECHTL GERHARD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INFINEON TECHNOLOGIES AUSTRIA AG
33 patentsUS9960157B2May 1, 2018
Bidirectional normally-off III-V high electron mobility transistor (HEMT)devices and circuits
INFINEON TECHNOLOGIES AUSTRIA AG10 citations84
US9837520B2Dec 5, 2017
Group III-nitride-based enhancement mode transistor having a multi-heterojunction fin structure
INFINEON TECHNOLOGIES AUSTRIA AG6 citations84
US9728630B2Aug 8, 2017
High-electron-mobility transistor having a buried field plate
INFINEON TECHNOLOGIES AUSTRIA AG7 citations84
US9917578B2Mar 13, 2018
Active gate-source capacitance clamp for normally-off HEMT
INFINEON TECHNOLOGIES AUSTRIA AG7 citations82
US9768258B1Sep 19, 2017
Substrate structure, semiconductor component and method
INFINEON TECHNOLOGIES AUSTRIA AG11 citations81
US11417758B2Aug 16, 2022
Enhancement mode Group III nitride-based transistor device
INFINEON TECHNOLOGIES AUSTRIA AG5 citations73
US11257941B2Feb 22, 2022
High electron mobility transistor with doped semiconductor region in gate structure
INFINEON TECHNOLOGIES AUSTRIA AG2 citations73
US10600710B2Mar 24, 2020
Semiconductor device
INFINEON TECHNOLOGIES AUSTRIA AG3 citations73
US10199216B2Feb 5, 2019
Semiconductor wafer and method
INFINEON TECHNOLOGIES AUSTRIA AG5 citations73
US10177061B2Jan 8, 2019
Semiconductor device
INFINEON TECHNOLOGIES AUSTRIA AG3 citations73
US10090406B2Oct 2, 2018
Non-planar normally off compound semiconductor device
INFINEON TECHNOLOGIES AUSTRIA AG4 citations73
US9847394B2Dec 19, 2017
Semiconductor device
INFINEON TECHNOLOGIES AUSTRIA AG5 citations73
US9837522B2Dec 5, 2017
III-nitride bidirectional device
INFINEON TECHNOLOGIES AUSTRIA AG6 citations73
US9647104B2May 9, 2017
Group III-nitride-based enhancement mode transistor having a heterojunction fin structure
INFINEON TECHNOLOGIES AUSTRIA AG5 citations73
US9570565B2Feb 14, 2017
Field effect power transistor metalization having a comb structure with contact fingers
INFINEON TECHNOLOGIES AUSTRIA AG3 citations73
US9553155B2Jan 24, 2017
Semiconductor device and method
INFINEON TECHNOLOGIES AUSTRIA AG4 citations73
US11349012B2May 31, 2022
Group III nitride-based transistor device and method of fabricating a gate structure for a group III nitride-based transistor device
INFINEON TECHNOLOGIES AUSTRIA AG2 citations70
US10126355B1Nov 13, 2018
Semiconductor probe test card with integrated hall measurement features
INFINEON TECHNOLOGIES AUSTRIA AG2 citations65
US11721754B2Aug 8, 2023
Enhancement mode transistor device
INFINEON TECHNOLOGIES AUSTRIA AG0 citations63
US9450063B2Sep 20, 2016
Semiconductor device and method
INFINEON TECHNOLOGIES AUSTRIA AG2 citations63
US12356653B2Jul 8, 2025
High electron mobility transistor with doped semiconductor region in gate structure
INFINEON TECHNOLOGIES AUSTRIA AG0 citations62
US11929430B2Mar 12, 2024
High electron mobility transistor with doped semiconductor region in gate structure
INFINEON TECHNOLOGIES AUSTRIA AG0 citations62
US11114554B2Sep 7, 2021
High-electron-mobility transistor having a buried field plate
INFINEON TECHNOLOGIES AUSTRIA AG0 citations62
US10411008B2Sep 10, 2019
System and method for depletion mode and enhancement mode transistors
INFINEON TECHNOLOGIES AUSTRIA AG1 citations62
US12159918B2Dec 3, 2024
Group III nitride-based transistor device
INFINEON TECHNOLOGIES AUSTRIA AG0 citations59
US10388736B2Aug 20, 2019
Methods of forming substrate structures and semiconductor components
INFINEON TECHNOLOGIES AUSTRIA AG1 citations59
US9515162B2Dec 6, 2016
Surface treatment of semiconductor substrate using free radical state fluorine particles
INFINEON TECHNOLOGIES AUSTRIA AG2 citations55
US12471305B2Nov 11, 2025
Water and ion barrier for III-V semiconductor devices
INFINEON TECHNOLOGIES AUSTRIA AG0 citations52
US10304923B2May 28, 2019
Method of forming a vertical potential short in a periphery region of a III-nitride stack for preventing lateral leakage
INFINEON TECHNOLOGIES AUSTRIA AG0 citations52
US10038051B2Jul 31, 2018
Vertical potential short in the periphery region of a III-nitride stack for preventing lateral leakage
INFINEON TECHNOLOGIES AUSTRIA AG0 citations52
US10038085B2Jul 31, 2018
High electron mobility transistor with carrier injection mitigation gate structure
INFINEON TECHNOLOGIES AUSTRIA AG1 citations52
US9620467B2Apr 11, 2017
Electronic component
INFINEON TECHNOLOGIES AUSTRIA AG0 citations52
US9412834B2Aug 9, 2016
Method of manufacturing HEMTs with an integrated Schottky diode
INFINEON TECHNOLOGIES AUSTRIA AG0 citations52
INFINEON TECHNOLOGIES AUSTRIA
4 patentsUS9048303B1Jun 2, 2015
Group III-nitride-based enhancement mode transistor
INFINEON TECHNOLOGIES AUSTRIA32 citations94
US9337279B2May 10, 2016
Group III-nitride-based enhancement mode transistor
INFINEON TECHNOLOGIES AUSTRIA6 citations84
US9142550B2Sep 22, 2015
High-voltage cascaded diode with HEMT and monolithically integrated semiconductor diode
INFINEON TECHNOLOGIES AUSTRIA9 citations84
US9263545B2Feb 16, 2016
Method of manufacturing a high breakdown voltage III-nitride device
INFINEON TECHNOLOGIES AUSTRIA3 citations73
SWAROVSKI AG
4 patentsUSD560542SJan 29, 2008
Artificial gemstone, natural gemstone ornamental object made of glass
SWAROVSKI AG20 citations93
USD544392SJun 12, 2007
Artificial gemstone, natural gemstone ornamental object made of glass
SWAROVSKI AG20 citations93
USD543892SJun 5, 2007
Artificial gemstone, natural gemstone ornamental object made of glass
SWAROVSKI AG25 citations93
USD605548SDec 8, 2009
Gemstone
SWAROVSKI AG2 citations63
PRECHTL GERHARD
2 patentsOSTERMAIER CLEMENS
2 patentsINFINEON TECHNOLOGIES AG
2 patentsSUSWAROVSKI AG
1 patentDOW CORING GMBH
1 patentINFINEON TECHNOLOGIES AMERICAS CORP
1 patentShowing the top 50 of 67 patents by PatentIndex Score.