Inventor
WU CHIH-NAN
TW21 patents
⚠️ This page may combine multiple inventors who share the name “WU CHIH-NAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
20 patentsUS9876114B2Jan 23, 2018
Structure and method for 3D FinFET metal gate
TAIWAN SEMICONDUCTOR MFG CO LTD61 citations98
US9437484B2Sep 6, 2016
Etch stop layer in integrated circuits
TAIWAN SEMICONDUCTOR MFG CO LTD28 citations93
US10367021B2Jul 30, 2019
Image sensor device and fabricating method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD12 citations92
US10998415B2May 4, 2021
Metal gate scheme for device and methods of forming
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10090242B2Oct 2, 2018
Etch stop layer in integrated circuits
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations83
US9466494B2Oct 11, 2016
Selective growth for high-aspect ration metal fill
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations82
US11522001B2Dec 6, 2022
Image sensor device
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10522640B2Dec 31, 2019
Metal gate scheme for device and methods of forming
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US9941376B2Apr 10, 2018
Metal gate scheme for device and methods of forming
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11257953B2Feb 22, 2022
Selective growth for high-aspect ratio metal fill
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US10797176B2Oct 6, 2020
Selective growth for high-aspect ratio metal fill
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations71
US9478660B2Oct 25, 2016
Protection layer on fin of fin field effect transistor (FinFET) device structure
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations63
US12272708B2Apr 8, 2025
Image sensor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11942419B2Mar 26, 2024
Etch stop layer in integrated circuits
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11404368B2Aug 2, 2022
Etch stop layer in integrated circuits
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10818716B2Oct 27, 2020
Image sensor device and fabricating method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9985133B2May 29, 2018
Protection layer on fin of fin field effect transistor (FinFET) device structure
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations52
US10720386B2Jul 21, 2020
Etch stop layer in integrated circuits
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10109741B2Oct 23, 2018
Selective growth for high-aspect ratio metal fill
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9601535B2Mar 21, 2017
Semiconducator image sensor having color filters formed over a high-K dielectric grid
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations38