Inventor
TU CHE-HAO
TW17 patents
⚠️ This page may combine multiple inventors who share the name “TU CHE-HAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
15 patentsUS10971370B2Apr 6, 2021
Hard mask removal method
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations83
US10510552B2Dec 17, 2019
Hard mask removal method
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations83
US9960050B2May 1, 2018
Hard mask removal method
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations83
US11854821B2Dec 26, 2023
Hard mask removal method
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US12593665B2Mar 31, 2026
Hard mask removal method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12568786B2Mar 3, 2026
Processing tool and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11951587B2Apr 9, 2024
Zone-based CMP target control
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12068196B2Aug 20, 2024
Forming gate line-end of semiconductor structures with improved metal gate height
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations56
US10943822B2Mar 9, 2021
Forming gate line-end of semiconductor structures
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations56
US9941109B2Apr 10, 2018
Surface treatment in a chemical mechanical process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US9922837B2Mar 20, 2018
Asymmetric application of pressure to a wafer during a CMP process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US10800004B2Oct 13, 2020
System and method of chemical mechanical polishing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48
US12128455B2Oct 29, 2024
Electrical cleaning tool for wafer polishing tool system
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations47
US9711374B2Jul 18, 2017
Mechanisms for forming oxide layer over exposed polysilicon during a chemical mechanical polishing (CMP) process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations41
US9595450B2Mar 14, 2017
Composite structure for gate level inter-layer dielectric
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations41