Inventor
INAZUKI YUKIO
JP100 patents
⚠️ This page may combine multiple inventors who share the name “INAZUKI YUKIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
39 patentsUS7767366B2Aug 3, 2010
Photomask blank and photomask
SHINETSU CHEMICAL CO34 citations92
US7736824B2Jun 15, 2010
Photomask blank, photomask, and method of manufacture
SHINETSU CHEMICAL CO26 citations92
US10078260B2Sep 18, 2018
Phase shift mask blank, phase shift mask, and blank preparing method
SHINETSU CHEMICAL CO7 citations84
US9366951B2Jun 14, 2016
Halftone phase shift photomask blank, halftone phase shift photomask and pattern exposure method
SHINETSU CHEMICAL CO8 citations84
US7790339B2Sep 7, 2010
Photomask blank
SHINETSU CHEMICAL CO8 citations84
US7691546B2Apr 6, 2010
Photomask blank and photomask
SHINETSU CHEMICAL CO10 citations84
US7625676B2Dec 1, 2009
Photomask blank, photomask and fabrication method thereof
SHINETSU CHEMICAL CO13 citations84
US7618753B2Nov 17, 2009
Photomask blank, photomask and method for producing those
SHINETSU CHEMICAL CO8 citations84
US8012654B2Sep 6, 2011
Photomask blank and photomask
SHINETSU CHEMICAL CO11 citations83
US8003284B2Aug 23, 2011
Photomask blank and photomask
SHINETSU CHEMICAL CO9 citations83
US7195846B2Mar 27, 2007
Methods of manufacturing photomask blank and photomask
SHINETSU CHEMICAL CO13 citations82
US6503669B2Jan 7, 2003
Photomask blank, photomask and method of manufacture
SHINETSU CHEMICAL CO8 citations74
US11624712B2Apr 11, 2023
Substrate defect inspection method and substrate defect inspection apparatus
SHINETSU CHEMICAL CO2 citations73
US10678125B2Jun 9, 2020
Photomask blank and method for preparing photomask
SHINETSU CHEMICAL CO5 citations73
US10564537B2Feb 18, 2020
Photomask blank, and preparation method thereof
SHINETSU CHEMICAL CO3 citations73
US10545401B2Jan 28, 2020
Phase shift mask blank, phase shift mask, and blank preparing method
SHINETSU CHEMICAL CO2 citations73
US10466582B2Nov 5, 2019
Method for preparing halftone phase shift mask blank, halftone phase shift mask blank, halftone phase shift mask, and thin film forming apparatus
SHINETSU CHEMICAL CO2 citations73
US10466583B2Nov 5, 2019
Halftone phase shift mask blank and halftone phase shift mask
SHINETSU CHEMICAL CO2 citations73
US10146122B2Dec 4, 2018
Halftone phase shift photomask blank and making method
SHINETSU CHEMICAL CO2 citations73
US9927695B2Mar 27, 2018
Halftone phase shift mask blank, halftone phase shift mask, and pattern exposure method
SHINETSU CHEMICAL CO3 citations73
US9645485B2May 9, 2017
Halftone phase shift photomask blank and making method
SHINETSU CHEMICAL CO4 citations73
US6641958B2Nov 4, 2003
Phase shift mask blank, phase shift mask, and methods of manufacture
SHINETSU CHEMICAL CO6 citations73
US10712654B2Jul 14, 2020
Photomask blank
SHINETSU CHEMICAL CO2 citations72
US10809611B2Oct 20, 2020
Method for preparing halftone phase shift mask blank, halftone phase shift mask blank, halftone phase shift mask, and thin film forming apparatus
SHINETSU CHEMICAL CO1 citations63
US7622227B2Nov 24, 2009
Phase-shift photomask-blank, phase-shift photomask and fabrication method thereof
SHINETSU CHEMICAL CO3 citations63
US6589699B2Jul 8, 2003
Photomask blank and photomask
SHINETSU CHEMICAL CO4 citations63
US6503668B2Jan 7, 2003
Phase shift mask blank, phase shift mask, and method of manufacture
SHINETSU CHEMICAL CO4 citations63
US12050396B2Jul 30, 2024
Reflective mask blank, method of manufacturing thereof, and reflective mask
SHINETSU CHEMICAL CO1 citations62
US11327393B2May 10, 2022
Photomask blank and method for preparing photomask
SHINETSU CHEMICAL CO0 citations62
US10989999B2Apr 27, 2021
Halftone phase shift mask blank and halftone phase shift mask
SHINETSU CHEMICAL CO0 citations62
US10372030B2Aug 6, 2019
Halftone phase shift mask blank and halftone phase shift mask
SHINETSU CHEMICAL CO1 citations62
US8007964B2Aug 30, 2011
Photomask blank and photomask
SHINETSU CHEMICAL CO2 citations62
US7556892B2Jul 7, 2009
Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method
SHINETSU CHEMICAL CO3 citations62
US7037625B2May 2, 2006
Phase shift mask blank and method of manufacture
SHINETSU CHEMICAL CO2 citations62
US6514642B2Feb 4, 2003
Phase shift mask and method of manufacture
SHINETSU CHEMICAL CO5 citations62
US7625677B2Dec 1, 2009
Half-tone stacked film, photomask-blank, photomask and fabrication method thereof
SHINETSU CHEMICAL CO3 citations61
US6733930B2May 11, 2004
Photomask blank, photomask and method of manufacture
SHINETSU CHEMICAL CO2 citations61
US10782608B2Sep 22, 2020
Method for preparing photomask blank, photomask blank, method for preparing photomask, photomask, and metallic chromium target
SHINETSU CHEMICAL CO1 citations60
US7351505B2Apr 1, 2008
Phase shift mask blank, phase shift mask, and pattern transfer method
SHINETSU CHEMICAL CO3 citations60
SHINETSU HANDOTAI KK
2 patentsTOPPAN PRINTING CO LTD
2 patentsINAZUKI YUKIO
2 patentsIGARASHI SHINICHI
2 patentsISHIKAWAJIMA MASTER METAL KK
1 patentSHIN ESTU CHEMICAL CO LTD
1 patentISHIKAWAJIMA HARIMA HEAVY IND
1 patentShowing the top 50 of 100 patents by PatentIndex Score.