Inventor
MONTGOMERY CECILIA ANNETTE
US3 patents
Patents
3 patentsUS6727047B2Apr 27, 2004
Method of extending the stability of a photoresist during direct writing of an image upon the photoresist
APPLIED MATERIALS INC31 citations88
US6969569B2Nov 29, 2005
Method of extending the stability of a photoresist during direct writing of an image
APPLIED MATERIALS INC18 citations80
US7208249B2Apr 24, 2007
Method of producing a patterned photoresist used to prepare high performance photomasks
APPLIED MATERIALS INC4 citations59