Inventor

FEDYNYSHYN THEODORE H

US24 patents

⚠️ This page may combine multiple inventors who share the name “FEDYNYSHYN THEODORE H”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FEDYNYSHYN THEODORE H

MASSACHUSETTS INST TECHNOLOGY

Resist materials for 157-nm lithography

Encapsulated inorganic resists

Resist methods and materials for UV and electron-beam lithography with reduced outgassing

Surface modified encapsulated inorganic resist

Resist with reduced line edge roughness

Immersion fluids for lithography

Contrast enhancing layers

Resist with reduced line edge roughness

High sensitivity X-ray photoresist

Low abosorbing resists for 157 nm lithography

3-d printed devices formed with magnetic inks and methods of making graded index structures

Resist materials for 157-nm lithography

3-D printed devices formed with conductive inks and method of making

Surface-emission cathodes having cantilevered electrodes

FEDYNYSHYN THEODORE H

Resist sensitizer

Directed material assembly

Inorganic resist sensitizer

Multi-tone resist compositions

OLIN CORP

Pyrithione-containing bioactive polymers and their use in paint and wood perservative products

Pyrithione-containing bioactive polymers and their use in paint and wood preservative products

Pyrithione-containing bioactive polymers and their use in paint and wood preservative products

Selected 4-hydroxyphenyl anilino alkoxysilanes and their use as antioxidants

SHIPLEY CO

Radiation sensitive compositions comprising blends of an aliphatic novolak resin and an aromatic novolak resin

HARVARD COLLEGE

Block copolymer ink formulation for 3D printing and method of making a 3D printed radiofrequency (RF) device